Boe Technology Group Co., Ltd.

Ordos Yuansheng Optoelectronics Co., Ltd.

Beijing 7invensun Technology Co., Ltd.

Beijing Naura Microelectronics Equipment Co., Ltd.

Beijing Boe Display Technology Co., Ltd.

Via Alliance Semiconductor Co., Ltd.

Meng Yang

Chao Wang

Lei Yang

Huafeng Liu

Shengwei Zhao

Chaochao Sun

Jingping Lv

Wei Liu

Lin Xie

Dongchun Ren

Fengmei Nie

Duolong Ding

Chongliang Hu

Bule Shun

Jian Wang

Xiaohu Gong

Shimin Sun

Yu Wang

Gang Wei

Jinrong Zhao

Lulu Ye

Yulin Peng

Shaohua Liu

Yali Fu

Wei Li

Guo Chen

Kai Yu

Zhen Huang

Xin Gao

Yao Li

Youngjin Song

Qihui Wang

Zhongfei Bai

Yunliang Zheng

Zhixue Dong

Shuangqiang Zhang

Xiaoyu Shen

Zhijiang Lou

Fan Gong Gong

The present disclosure discloses a method and apparatus for filtering glints. The method includes that: a first image and a reference image matched with the first image are acquired, and first-type glints are displayed in the first image; second-type glints in the first image are determined according to the reference image, and the second-type glints are glints obtained by estimating glints in the first image on the basis of the reference image; a matching result of the first-type glints and the second-type glints is determined according to first positions of the first-type glints and second positions of the second-type glints; and the first-type glints are filtered according to the matching result.

Method and apparatus for filtering glints

A pixel structure and a manufacturing method thereof, an array substrate and a display device are provided. The pixel structure includes: a signal line; a common electrode line an extension direction of which is same as an extension direction of the signal line; a transistor including a semiconductor layer which includes a source region and a drain region; a first storage electrode which is insulated from the common electrode line and is connected with the drain region of the semiconductor layer; and a second storage electrode which is connected with the common electrode line and is insulated from the first storage electrode. In the pixel structure, portions, between the signal line and the common electrode line, of the first storage electrode and the second storage electrode includes overlap with each other to form a first storage capacitance.

Pixel structure and manufacturing method thereof, array substrate and display device

The present application discloses a first display substrate including a plurality of core-coil assemblies configured to detect a touch. Each of the plurality of core-coil assemblies includes a first base substrate; a core layer on the first base substrate and including a plurality of magnetic permeable cores substantially along a first direction and spaced apart from each other, each of the plurality of magnetic permeable cores substantially along a second direction; and a conductive coil wound around the plurality of magnetic permeable cores for multiple turns and insulated from the core layer.

Display substrate having a plurality of core-coil assemblies configured to detect a touch and display panel having the same

The disclosure discloses a calibration method and device, a storage medium and a processor. The method includes that: a calibration point is controlled to move on a predetermined motion track; a gaze track of a target object is acquired in a movement process of the calibration point; and a specified parameter is calibrated according to the predetermined motion track and the gaze track, the specified parameter is configured to predict a gaze point of the target object.

Calibration method and device, storage medium and processor

Disclosed is a method and apparatus for determining a position of a pupil. The method includes: acquiring an image to be detected including a pupil; acquiring a binary image of a preset area based on a preset model of semi-supervised learning, where the preset area is an area where the pupil is located in the image to be detected; acquiring a centroid of the binary image; and determining a central position of the pupil according to the centroid of the binary image.

Method and apparatus for determining position of pupil

The present disclosure discloses a method and apparatus for determining a pupil position. The method includes that: at least one first parameter of a pupil in an image, an initial edge region of the pupil and at least one second parameter of at least one light spot in the image are acquired; the initial edge region is corrected according to the at least one first parameter and the at least one second parameter to obtain a first edge region; a pupil edge region is determined according to an edge section in the first edge region, and the edge section is a region formed by a point set meeting a first preset condition in the first edge region; and fitting processing is performed on the pupil edge region to obtain a position of the pupil.

Method and apparatus for determining pupil position

The present disclosure provides an array substrate, its driving method and manufacturing method, and a display device. The array substrate includes a transistor layer arranged on a base, and a first transparent conductive layer, a first insulation layer, a second transparent conductive layer, a second insulation layer and a third transparent conductive layer sequentially arranged on the transistor layer. The first transparent conductive layer covers the transistor layer at a display area, the second transparent conductive layer includes a pattern of touch electrodes, and the third transparent conductive layer includes a pattern of pixel electrodes. Within any pixel area of the display area, the pixel electrode is connected to a pixel electrode connection end of the transistor layer through a via-hole in the first insulation layer and the second insulation layer, and the first transparent conductive layer is provided with an opening at a position corresponding to the via-hole.

Array substrate, its driving method and manufacturing method, and display device

The present application discloses a method of fabricating a thin film transistor, including forming a semiconductor layer having a pattern corresponding to that of the active layer on a base substrate; forming a first photoresist layer on a side of the semiconductor layer distal to the base substrate; the first photoresist layer being in an area corresponding to the channel region, the second doped region, and the fourth doped region; doping a region of the semiconductor layer corresponding to the first doped region and the third doped region using the first photoresist layer as a mask plate; forming a second photoresist layer by removing a portion of the first photoresist layer to expose an initial portion of the semiconductor layer corresponding to at least a portion of the second doped region and at least a portion of the fourth doped region; and doping the initial portion of the semiconductor layer using the second photoresist layer as a mask plate.

Thin film transistor, display substrate and display panel having the same, and fabricating method thereof

Some embodiments of the present disclosure provide a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus includes a chamber, a support and a liner. The chamber is configured for plasma processes and includes a chamber wall. The support is configured to hold a wafer in the chamber. The liner is configured to surround the support and includes a top side and a bottom side. The top side is detachably hung on the chamber wall. The bottom side includes gas passages for plasma particles to pass through the liner.

Method of operating semiconductor manufacturing apparatus and semiconductor devices

Preparation method for a thin film transistor, preparation method for an array substrate, an array substrate, and a display apparatus are provided. The preparation method for a thin film transistor includes: forming, on a pattern of a semiconductor layer, a first photoresist pattern including a photoresist with two different thicknesses, and performing a heavily-doped ion implantation process on the pattern of the semiconductor layer by using the first photoresist pattern as a barrier mask; ashing the first photoresist pattern to remove the photoresist with a second thickness and to thin the photoresist with a first thickness, so as to form a second photoresist pattern; and performing a lightly-doped ion implantation process on the pattern of the semiconductor layer by using the second photoresist pattern as a barrier mask.

Preparation method for thin film transistor, preparation method for array substrate, array substrate, and display apparatus

Some embodiments of the present disclosure provide a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus includes a chamber, a support and a liner. The chamber is configured for plasma processes and includes a chamber wall. The support is configured to hold a wafer in the chamber. The liner is configured to surround the support and includes a top side and a bottom side. The top side is detachably hung on the chamber wait. The bottom side includes gas passages for plasma particles to pass through the liner.

Apparatus for plasma treatment and method of operating the apparatus

A loop predictor trains a branch instruction to determine a trained loop count of a loop. When the loop fits in an instruction buffer, the processor stops fetching from an instruction cache, sends the loop instructions to an execution engine from the buffer without fetching from the cache, maintains a loop pop count of times the branch is sent to the execution engine from the buffer, and predicts the branch instruction is taken when the loop pop count is less than the trained loop count and otherwise predicts not taken.

Loop predictor-directed loop buffer

The present disclosure provides a stripping apparatus including a cleaning device, a transition unit and a stripping device. The cleaning device includes a first cleaning unit, a second cleaning unit and a third cleaning unit. The stripping device is connected with the transition unit; the transition unit is further connected with the first cleaning unit; the first cleaning unit is further connected with the second cleaning unit; the second cleaning unit is further connected with the third cleaning unit. Temperatures of the first cleaning unit, the second cleaning unit and the third cleaning unit are gradually decreased. The temperature of the third cleaning unit is equal to the temperature of water injected into the third cleaning unit.

Stripping apparatus and method using the same to clean glass substrates

Growing community of inventors

Beijing, China

Meng Yang