Taiwan Semiconductor Manufacturing Comp. Ltd.

Meng-Tze Chen

Shih-Ming Chang

Ken-Hsien Hsieh

Kuei-Shun Chen

Meng-Wei Chen

Chen-Hau Wu

Yu-Chin Huang

Li-Hsiang Lai

Provided is a material composition and method for inhibiting the printing of SRAFs onto a substrate including coating a substrate with a resist layer. After coating the substrate, the resist layer is patterned to form a main feature pattern and at least one sub-resolution assist feature (SRAF) pattern within the resist layer. The main feature pattern may include resist sidewalls and a portion of a layer underlying the patterned resist layer. In various examples, a material composition is deposited over the patterned resist layer and into each of the main feature pattern and the at least one SRAF pattern. Thereafter, a material composition development process is performed to dissolve a portion of the material composition within the main feature pattern and to expose the portion of the layer underlying the patterned resist layer.

Material composition and process for mitigating assist feature pattern transfer

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Taipei, Taiwan

Meng-Tze Chen