Taiwan Semiconductor Manufacturing Comp. Ltd.

Meng Lin Chang

Tseng Chin Lo

Bo-Sen Chang

Chih-Ting Sun

Kung-Cheng Lin

Yueh-Yi Chen

Ying-Jung Chen

Integrated circuits and methods for overlap measure are provided. In an embodiment, an integrated circuit includes a plurality of functional cells including at least one gap disposed adjacent to at least one functional cell of the plurality of functional cells and a first overlay test pattern cell disposed within the at least one gap, wherein the first overlay test pattern cell includes a first number of patterns disposed along a first direction at a first pitch. The first pitch is smaller than a smallest wavelength on a full spectrum of humanly visible lights.

Method of measuring mask overlay using test patterns

Integrated circuit overlay test patterns and method thereof

Growing community of inventors

Hsinchu, Taiwan

Meng Lin Chang