Winbond Electronics Corporation

Meng-Hung Lin

Bo-Lun Wu

Frederick Chen

Ting-Ying Shen

Ping-Kun Wang

Po-Yen Hsu

Chia-Hua Ho

Shao-Ching Liao

Ming-Che Lin

Yi-Hsiu Chen

Chuan-Sheng Chou

Hsiu-Han Liao

Chien-Min Wu

Chang-Tsung Pai

Shuo-Che Chang

Ying-Fu Tung

Chia Hua Ho

Kuang-Chih Hsieh

Han-Hsiu Chen

A RRAM and its manufacturing method are provided. The RRAM includes an interlayer dielectric layer, a first bottom contact structure, and a second bottom contact structure formed on a substrate. A first memory cell is formed on the first bottom contact structure. The first memory cell includes a first bottom electrode layer which includes a first conductive region. A pattern in which the first conductive region is vertically projected on the first bottom contact structure is a first projection pattern. A second memory cell is formed on the second bottom contact structure. The second memory cell includes a second bottom electrode layer which includes a second conductive region. A pattern in which the second conductive region is vertically projected on the second bottom contact structure is a second projection pattern. The second projection pattern is different from the first projection pattern.

Resistive random access memory and manufacturing method thereoff

A key generator including a first access circuit, a first calculating circuit and a first certification circuit is provided. The first access circuit writes first predetermined data to a first resistive memory cell during a write period and reads a first current passing through the first resistive memory cell after a randomization process. The first calculating circuit calculates the first current to generate a first calculation result. The first certification circuit generates a first password according to the first calculation result.

Key generator with resistive memory and method thereof

A memory device includes: a resistive switching layer, a conductive pillar, a barrier layer, a word line, a plurality of resistive layers, and a plurality of bit lines. The resistive switching layer is shaped as a cup and has an inner surface to define an opening. The conductive pillar is disposed in the opening. The barrier layer is disposed between the resistive switching layer and the conductive pillar. The word line is electrically connected to the conductive pillar. The resistive layers are respectively distributed on an outer surface of the resistive switching layer. The bit lines are electrically connected to the resistive layers, respectively.

Memory device

An RRAM structure and its manufacturing method are provided. The RRAM structure includes a bottom electrode layer, a resistance switching layer, and an implantation control layer sequentially formed on a substrate. The resistance switching layer includes a conductive filament confined region and an outer region surrounding the conductive filament confined region. The RRAM structure includes a protective layer and a top electrode layer. The protective layer conformally covers the bottom electrode layer, the resistance switching layer, and the implantation control layer and has a first opening. The top electrode layer is located on the implantation control layer, and a portion of the top electrode layer is filled into the first opening. The position of the top electrode layer corresponds to that of the conductive filament confined region, and the top surface of the top electrode layer is higher than that of the protective layer.

Resistive random access memory structure and manufacturing method thereof

A resistive random access memory (RRAM) is provided. The RRAM includes a lower electrode, an upper electrode, a first variable resistance layer and a second variable resistance layer. The lower electrode is disposed on a substrate, and is a single electrode or a pair of electrodes electrically connected to each other. The upper electrode is disposed on the lower electrode, and overlaps the lower electrode. The first variable resistance layer and the second variable resistance layer are disposed on the substrate. At least a portion of the first variable resistance layer is disposed between the lower electrode and the upper electrode, and at least a portion of the second variable resistance layer is disposed between the lower electrode and the upper electrode and connected to the first variable resistance layer.

Resistive random access memory

A resistive random access memory is provided. The resistive random access memory includes a bottom electrode over a substrate, a top electrode, a resistance-switching layer, an oxygen exchange layer, and a sidewall protective layer. The top electrode is disposed over the bottom electrode. The resistance-switching layer is disposed between the bottom electrode and the top electrode. The oxygen exchange layer is disposed between the resistance-switching layer and the top electrode. The sidewall protective layer containing metal or semiconductor is disposed at sidewalls of the resistance-switching layer, and the sidewalls of the resistance-switching layer is doped with the metal or semiconductor from the sidewall protective layer.

A memory storage apparatus including a memory cell array and a memory control circuit is provided. The memory cell array includes a plurality of memory cells. The memory cell array is configured to store data. The memory control circuit is coupled to the memory cell array. The memory control circuit is configured to apply one of a set signal and a reset signal to a target memory cell among the memory cells to generate a read current. The memory control circuit receives a read current of the target memory cell. The memory control circuit compares the read current with a reference current. The memory control circuit determines whether the target memory cell is failed according to a comparison result. In addition, a method for testing a memory storage apparatus is also provided.

Memory storage apparatus and method for testing memory storage apparatus

A resistive random access memory is provided. The resistive random access memory includes a bottom electrode, a top electrode, a resistance-switching layer, an oxygen exchange layer, and a sidewall protective layer. The bottom electrode is disposed over a substrate. The top electrode is disposed over the bottom electrode. The resistance-switching layer is disposed between the bottom electrode and the top electrode. The oxygen exchange layer is disposed between the resistance-switching layer and the top electrode. The sidewall protective layer as an oxygen supply layer is at least disposed at sidewalls of the oxygen exchange layer.

The invention provides a memory device and a manufacturing method thereof. The memory device includes a substrate, a capacitor, a protection device, a first metal interconnect, and a second metal interconnect. The capacitor is located on the substrate of a first region. The protection device is located in the substrate of a second region. The capacitor includes a plurality of bottom electrodes, a top electrode, and a capacitor dielectric layer. The top electrode has a first portion and a second portion, wherein the second portion is extended to the second region. The capacitor dielectric layer is located between the bottom electrodes and the top electrode. The first metal interconnect is located between the capacitor and the substrate. The second metal interconnect is located between the second portion of the top electrode and the protection device. The top electrode is electrically connected to the protection device through the second metal interconnect.

Memory device and method of manufacturing the same

A writing method for a resistive memory apparatus is provided. In the method, logic data is received, and a corresponding selection memory cell is selected. A logic level of the logic data is determined. When the logic data is at a first logic level, a RESET pulse is provided to the selection memory cell and then a SET pulse smaller than a reference write current and having a near-rectangular pulse width is provided to the selection memory cell during a writing period. When the logic data is at a second logic level, the RESET pulse is provided to the selection memory cell and then a SET pulse larger than the reference write current and having the near-rectangular pulse width is provided to the selection memory cell during the writing period.

Writing method for resistive memory apparatus

A resistive memory apparatus and a writing method thereof are provided. In the method, logic data is received, and a corresponding resistive memory cell is selected. A logic level of the logic data is determined. When the logic data is in a first logic level, where a first reading current of the corresponding resistive memory cell is greater than a first reference current, a set pulse and a reset pulse are provided to the resistive memory cell during a writing period. When the logic data is in a second logic level, where a second reading current of the resistive memory cell is smaller than a second reference current, the reset pulse is provided to the resistive memory cell during the writing period. Polarities of the reset pulse and the set pulse are opposite.

Resistive memory apparatus and writing method thereof

A resistive memory apparatus and a reading method thereof are provided. In this method, two reading pulses are applied to a resistive memory cell, such that a first reading resistance and a second reading resistance of the resistive memory cell at different temperatures are sequentially obtained. Next, a resistive state of the second reading resistance is determined according to the reading resistances and the temperatures corresponding to the reading resistances. Thereafter, a logic level of storage data of the resistive memory cell is determined according to the resistive state of the second reading resistance.

Resistive memory apparatus and reading method thereof

A resistive memory and a repairing method of the resistive memory are provided. Steps of the repairing method includes: operating a plurality of set-reset cycles on the resistive memory; detecting whether the resistive memory encounters an over-set issue after the set-reset cycles are operated; if the resistive memory encounters the over-set issue, executing an enhanced reset programming on the resistive memory. Here, the enhanced reset programming is executed by applying an enhanced reset voltage on the resistive memory during an enhanced reset time period. A product of the enhanced reset voltage and the enhanced reset time period is larger than a product of a reset voltage and a reset time period.

Resistive memory and repairing method thereof

Provided is a resistive random access memory including a first electrode layer, a second electrode layer, and a variable resistance layer disposed between the first electrode layer and the second electrode layer, wherein the second electrode layer includes a first sublayer, a second sublayer, and a conductive metal oxynitride layer disposed between the first sublayer and the second sublayer.

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Taichung, Taiwan

Meng-Hung Lin