Osg Corporation

Tohoku University

Mei Wang

Masatoshi Sakurai

Junichi Koike

Yuji Sutou

Hiroaki Sugita

Hiroyuki Hanyu

Toshihiro Ohchi

Shoko Komiyama

A hard coating includes three kinds of alternately laminated layers. The three kinds of layers consist of two kinds of single composition layers and a nanolayer-alternated layer. The two kinds of single composition layers are constituted by respective two of an A composition, a B composition and a C composition, wherein the A composition is a nitride of AlCr&#x3b1;, the B composition is a nitride of AlCrSi&#x3b2;, and the C composition is a nitride of AlCr(SiC)&#x3b3;. The nanolayer-alternated layer includes two kinds of nanolayers which are constituted by respective two of the A composition, the B composition and the C composition and which are alternately laminated. Each of the two kinds of single composition layers has a thickness of 0.5-1000 nm. Each of the two kinds of nanolayers has a thickness of 0.5-500 nm, and the nanolayer-alternated layer has a thickness of 1-1000 nm.

Hard coating and hard-coating-covered member

A hard coating includes a three kinds of layers that are alternately laminated. The three kinds of layers consist of a single composition layer and two kinds of nanolayer-alternated layers. The single composition layer is constituted by one of an A composition (nitride of AlCr&#x3b1;), a B composition (nitride of AlTiCr&#x3b2;) and a C composition (nitride of AlCr(SiC)&#x3b3;). The two kinds of nanolayer-alternated layers include nanolayers which are alternately laminated and which are constituted by two of three combinations consisting of a combination of the A composition and B composition, a combination of the A composition and C composition and a combination of the B composition and C composition. The single composition layer has a thickness of 0.5-1000 nm. Each of the nanolayers constituting the two kinds of nanolayer-alternated layers has a thickness of 0.5-500 nm, and each of the two kinds of nanolayer-alternated layers has a thickness of 1-1000 nm.

A hard coating includes a three kinds of layers that are alternately laminated. The three kinds of layers consist of a single composition layer and two kinds of nanolayer-alternated layers. The single composition layer is constituted by one of an A composition (nitride of AlCrSi&#x3b1;), a B composition (nitride of AlTiSi&#x3b2;) and a C composition (nitride of AlCr(SiC)&#x3b3;). The two kinds of nanolayer-alternated layers include nanolayers which are alternately laminated and which are constituted by two of three combinations consisting of a combination of the A composition and B composition, a combination of the A composition and C composition and a combination of the B composition and C composition. The single composition layer has a thickness of 0.5-1000 nm. Each of the nanolayers constituting the two kinds of nanolayer-alternated layers has a thickness of 0.5-500 nm, and each of the two kinds of nanolayer-alternated layers has a thickness of 1-1000 nm.

A hard coating includes a three kinds of layers that are alternately laminated. The three kinds of layers consist of a single composition layer and two kinds of nanolayer-alternated layers. The single composition layer is constituted by one of an A composition (nitride of AlCrSi&#x3b1;), a B composition (nitride of CrBSi&#x3b2;) and a C composition (nitride of AlCr(SiC)&#x3b3;). The two kinds of nanolayer-alternated layers include nanolayers which are alternately laminated and which are constituted by two of three combinations consisting of a combination of the A composition and B composition, a combination of the A composition and C composition and a combination of the B composition and C composition. The single composition layer has a thickness of 0.5-1000 nm. Each of the nanolayers constituting the two kinds of nanolayer-alternated layers has a thickness of 0.5-500 nm, and each of the two kinds of nanolayer-alternated layers has a thickness of 1-1000 nm.

A hard film for coating a surface of a base material, the hard film includes a layer A, a layer B, and a nanolayer-alternating layer. The layer A is an AlTiCr nitride of (AlTiCr&#x3b1;)N, where &#x3b1; is one or more elements selected from C, B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The layer B is an AlTiCr nitride or AlTiCr carbonitride of (AlTiCr&#x3b2;)CN, where &#x3b2; is one or more elements selected from B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The nanolayer-alternating layer is formed by alternately laminating a nanolayer A or a nanolayer B having the same composition as the layer A or B. And, the layer C is an AlCr(SiC) nitride or AlCr(SiC) carbonitride of [AlCr(SiC)&#x3b3;]CN, where &#x3b3; is one or more elements selected from B, Ti, V, Y, Zr, Nb, Mo, Hf, Ta, and W.

Hard coating and member coated with hard coating

A hard coating, which is to be disposed to cover a surface of a substrate, has a total thickness of 0.5-20 &#x3bc;m, and includes an A layer and nanolayer-alternated layer that are alternately laminated by physical vapor deposition. The nanolayer-alternated layer includes a B layer and a C layer that are alternately laminated. The A layer has a thickness of 50-1000 nm and is AlCr nitride that is represented by a composition formula of [AlCr]N wherein an atomic ratio U is 0.20-0.80. The B layer has a thickness of 1-100 nm and is TiAl nitride that is represented by a composition formula of [TiAl]N wherein an atomic ratio W is 0.30-0.85. The C layer has a thickness of 1-100 nm and is TiSi nitride that is represented by a composition formula of [TiSi]N wherein an atomic ratio Y is 0.05-0.45. The nanolayer-alternated layer has a thickness of 50-1000 nm.

Hard coating and hard coating-covered member

A hard coating, which is to disposed to cover a surface of a tool substrate, has a total thickness of 0.5-20 &#x3bc;m and includes an A layer and nanolayer-alternated layer that are alternately laminated by physical vapor deposition. The nanolayer-alternated layer includes a B layer and C layer that are alternately laminated. The A layer has a thickness of 50-1000 nm and is AlCr(SiC) nitride that is represented by a composition formula of [AlCr(SiC)]N wherein an atomic ratio W is 0.20-0.80 and an atomic ratio X is 0.01-0.20. The B layer has a thickness of 1-100 nm and is TiAl nitride that is represented by a composition formula of [TiAl]N wherein an atomic ratio Y is 0.30-0.85. The C layer has a thickness of 1-100 nm and is Ti(SiC) nitride represented by a composition formula of [Ti(SiC)]N wherein an atomic ratio Z is 0.05-0.45. The nanolayer-alternated layer has a thickness of 50-1000 nm.

A hard lubrication film, with which a surface of a base material is coated, has two or more alternately laminated layers that are one or more A-layers made of (CrMoWVB)CNand one or more B-layers made of (CrMoWVB)CNO. Atom ratios a, b, c, d, e=1&#x2212;a&#x2212;b&#x2212;c&#x2212;d, x+y, and y related to A-layers satisfy 0.2&#x2264;a&#x2264;0.7, 0.05&#x2264;b&#x2264;0.6, 0&#x2264;c&#x2264;0.3, 0&#x2264;d&#x2264;0.05, 0&#x2264;e&#x2264;0.05, 0.3&#x2264;x+y&#x2264;0.6, and 0&#x2264;y&#x2264;0.6, respectively. Atom ratios a, b, c, d, e=1&#x2212;a&#x2212;b&#x2212;c&#x2212;d, x, y, z, and x+y+z related to B-layers satisfy 0.2&#x2264;a&#x2264;0.7, 0.05&#x2264;b&#x2264;0.6, 0&#x2264;c&#x2264;0.3, 0&#x2264;d&#x2264;0.05, 0&#x2264;e&#x2264;0.05, 0&#x2264;x&#x2264;0.6, 0&#x2264;y&#x2264;0.6, 0&#x3c;z&#x2264;0.6, and 0.3&#x2264;x+y+z&#x2264;0.6, respectively. Each A-layer has a film thickness within a range of 2 nm or more to 1000 nm or less, each B-layer has a film thickness within a range of 2 nm or more to 500 nm or less, and wherein the hard lubrication film has a total film thickness within a range of 0.1 &#x3bc;m or more to 10.0 &#x3bc;m or less.

Hard lubricating coating film and hard lubricating coating film-covered tool

A tool hard film that is to be disposed as coating on a surface of a tool, the tool hard film being a TiCrMoWV oxycarbide, oxynitride, or oxycarbonitride having a phase with a NaCl-type crystal structure as a main phase, the oxycarbide, oxynitride, or oxycarbonitride having fine crystals due to introduction of oxygen.

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Toyokawa, Japan

Mei Wang