Shin-etsu Chemical Co., Ltd.

Meguru Kashida

Yoshihiro Kubota

Yoshihiko Nagata

Yuichi Hamada

Hitoshi Noguchi

Satoru Miyawaki

Mikio Aramata

Tetsuo Nakanishi

Toru Shirasaki

Hirofumi Fukuoka

Yasuaki Hara

Shinichi Sato

Shoji Ichinohe

Hirofumi Kishita

Kenichi Isobe

Toshio Ohba

Masahiko Ogawa

Haruyoshi Kuwabara

Satoshi Kawakami

Akio Otsuka

Sakae Kawaguchi

Takashi Matsuoka

Satoshi Watanabe

Toshinobu Ishihara

Yasushi Yamamoto

Hiroshi Inomata

Kouichi Yamaguchi

Tadao Nomura

Ikuo Fukui

Koichiro Watanabe

Hisashi Aoki

Yoshio Tawara

Yoshiaki Shimizu

Ikuo Sakurai

Katsushi Tokunaga

Kiyohiro Kondow

Kimitaka Kumagae

Hiroki Konno

Yasuyuki Maki

A separator carries lithium particles on its surface. Using the separator, a non-aqueous electrolyte secondary battery having a high initial efficiency and improved cycle retentivity is available.

Separator for non-aqueous secondary battery, making method, and non-aqueous electrolyte secondary battery

A sintered silicon oxide for film vapor deposition having a density of 1.0 to 2.0 g/cm, three-point flexural strength of at least 50 g/mm, and a BET specific surface area of 0.1 to 20 m/g is provided. When this sintered silicon oxide is used for evaporation source of a film, pin holes and other defects of the film caused by the problematic splash phenomenon can be reliably prevented and stable production of a reliable package material having excellent gas barrier property is been enabled. This invention also provides a method for producing such sintered silicon oxide, and this method can be used in a large scale production without requiring any special technology, and therefore, this method is capable of supplying the market with the sintered silicon oxide at reduced cost.

Sintered silicon oxide for film vapor deposition, its production method, and method for producing silicon oxide vapor deposition film

A silicon-silicon oxide-lithium composite comprises a silicon-silicon oxide composite having such a structure that silicon grains having a size of 0.5-50 nm are dispersed in silicon oxide, the silicon-silicon oxide composite being doped with lithium. Using the silicon-silicon oxide-lithium composite as a negative electrode material, a lithium ion secondary cell having a high initial efficiency and improved cycle performance can be constructed.

Silicon-silicon oxide-lithium composite, making method, and non-aqueous electrolyte secondary cell negative electrode material

A carbonate-modified silane or siloxane is combined with a non-aqueous solvent and an electrolyte salt to form a non-aqueous electrolytic solution, which is used to construct a secondary battery having improved charge/discharge characteristics.

Non-aqueous electrolytic solution, secondary battery, and electrochemical capacitor

A cyclic carbonate-modified silane or siloxane is combined with a non-aqueous solvent and an electrolyte salt to form a non-aqueous electrolytic solution, which is used to construct a secondary battery having improved temperature and high-output characteristics.

Cyclic carbonate-modified organosilicon compound, non-aqueous electrolytic solution, secondary battery and capacitor

A non-aqueous electrolytic solution is provided comprising a non-aqueous solvent, an electrolyte salt, and a siloxane modified with ether bond-bearing organic group. A non-aqueous electrolyte secondary battery using the same has improved characteristics both at low temperatures and at high outputs.

Non-aqueous electrolytic solution and battery

A siloxane modified with a cyclic carbonate of the formula: is combined with a non-aqueous solvent and an electrolyte salt to form a non-aqueous electrolytic solution, which is used to construct a secondary battery having improved temperature and cycle characteristics.

Cyclic carbonate-modified siloxane, method of making, non-aqueous electrolytic solution, secondary battery, and capacitor

A non-aqueous electrolytic solution is provided comprising a non-aqueous solvent, an electrolyte salt, and a siloxane-modified polyoxyalkylene compound having (poly)organosiloxane structures at both ends of polyoxyalkylene. A secondary battery using the same has improved temperature characteristics and high-output characteristics.

Non-aqueous electrolytic solution and secondary battery

There is disclosed a pellicle having a pellicle frame with at least one vent for controlling atmospheric pressure and a filter attached so as to cover the vent, wherein it takes 5 minutes to 180 minutes, to restore a pellicle film swelled during a step of attaching the pellicle to the exposure original plate under atmospheric pressure of 760 mmHg followed by reducing atmospheric pressure to 500 mmHg and keeping the pressure, to the original state and a method for producing it, and a pellicle with a filter having a pellicle frame with at least one vent for controlling atmospheric pressure wherein all over the inner surface of the filter attached so as to cover said vent is impregnated with a resin, and 50% by volume or more of the filter is impregnated therewith. There can be provided a pellicle with a filter having both of impurity-trapping performance and ventilating performance, and a method for producing it, and a pellicle with a filter having ventilating performance wherein impurities can be fixed without being released even under violent airflow such as air blow or the like and finer impurities can be trapped, with keeping ventilating performance.

Pellicle with a filter and method for production thereof

There is disclosed a jig for producing a pellicle comprising a support frame having an opening, and an adhesive layer provided at periphery of the opening, wherein the adhesive layer is composed of a polymer material having a glass transition temperature within a range of 0&deg; C. to 300&deg; C. The jig of the present invention can be repeatedly used without reforming the adhesive layer after use.

Jig for producing pellicle and method for producing pellicle using the same

Proposed is a frame-supported pellicle used for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of electronic fine devices such as LSIs, VLSIs and the like by mounting thereon. The inventive frame-supported pellicle is characterized in that the pellicle frame, to which a pellicle membrane is adhesively bonded on one of the end surfaces, is partly subjected to smoothing treatment. The inventive frame-supported pellicle can solve the heretofore unavoidable problems of dust particle deposition on the photomask even under dustproof protection with a pellicle as well as the high cost of the preparation of the pellicle and the difficulty of finding of any dust particles deposited on the surface of the frame.

Frame-supported dustproof pellicle for photolithographic photomask

A pellicle for a mask or substrate including a frame having one end surface and another end surface and a membrane extended over the frame on the one end surface side. A channel is formed in the other end surface of the frame. The channel is filled with a layer of a tackifier capable of expanding upon heating and/or light irradiation such that the tackifier layer does not protrude outward beyond the other end surface of the frame in an unexpanded state, but protrudes outward beyond the other end surface of the frame when expanded. No liner is attached to the tackifier layer.

Pellicle for a mask or substrate

Proposed is an improvement in a frame-supported pellicle, which is a device for dust-proof protection of a photomask used in the photolithographic patterning works in the manufacture of fine electronic devices, consisting of a rigid pellicle frame, a highly transparent membrane of a plastic resin spread over and adhesively bonded to one end surface of the pellicle frame in a slack-free fashion and a layer of a pressure-sensitive adhesive formed on the other end surface of the pellicle frame to facilitate mounting of the frame-supported pellicle on the surface of a photomask and to secure the same at the correct position. The improvement comprises forming the layer of the pressure-sensitive adhesive on the end surface of the pellicle frame to have an outwardly convex surface, for example, in the form of a barrel vault instead of the flat surface in the prior art so that the troubles in the prior art due to occurrence of air gaps between the surface of the adhesive layer and the surface of the photomask unavoidable in mounting of the conventional frame-supported pellicle can be prevented to ensure completely air-tight sealing thereby. The adverse influence on the pellicle membrane due to the air-tightness of sealing by the pressure difference between the outer and inner surfaces can be overcome by providing a penetrating opening for air escape in the pellicle frame covered with a filter sheet.

Frame-supported pellicle for photomask protection

Disclosed is a frame-supported pellicle, which is an integral body consisting of a rigid frame and a transparent plastic film adhesively bonded to one end surface of the frame in a slack-free fashion, for dustproof protection of a photomask used in a photolithographic patterning work in the manufacture of fine electronic devices such as LSIs and liquid crystal display panels. The frame-supported pellicle is prepared by bonding the frame and plastic film with an adhesive having a glass transition temperature substantially lower than that of the polymeric resin forming the film and the adhesive bonding work is performed at a temperature higher than the glass transition temperature of the adhesive but lower than that of the polymeric resin of the film so that excellent adhesive bonding strength can be obtained between the frame and the resin film still without causing any adverse influences on the resin film such as distortion and crease formation.

Growing community of inventors

Gunma, Japan

Meguru Kashida