Hitachi High-tech Corporation

Toshiba Battery Co., Ltd.

Megumi Nakamura

Hisayuki Takasu

Atsushi Kamino

Hitoshi Kamoshida

Manami Nakazawa

Kento Horinouchi

Shota Aida

Miki Suzuki

A performance of a sample holderused in a charged particle beam device is improved. A shield plateis connected to a sample stand. A sample standis provided with a pressing memberthat can move in a direction perpendicular to the shield platein a state in which the pressing member is attached to the sample stand, and has a bar shape. A sample supporting memberconnected to the pressing memberis provided at a position facing the shield plate. A springis provided along an outer circumference of the pressing memberand is connected to the sample supporting memberand the sample stand

Sample holder, method for using sample holder, projection amount adjustment jig, projection amount adjustment method and charged particle beam device

The invention provides an ion milling device capable of cross-sectional milling on an all-solid-state battery while reducing an occurrence of a short circuit due to a redeposition film. The ion milling device includes a sample stageon which a sampleis placed, an ion sourceconfigured to emit an unfocused ion beamtoward the sample, a stage controllerconfigured to cause the sample stage to perform a swing operation centered on a swing axis Sset to be orthogonal to an ion beam center Bof the ion beam, and cause the sample stage to perform a sliding operation along a line of intersection between a plane (YZ plane) including the ion beam center and perpendicularly intersecting the swing axis and a sample placement surface of the sample stage, in which the stage controller causes, in a first mode operation, the sample stage to perform the swing operation and the ion source to emit the ion beam to mill the sample, and causes in a second mode operation, the sample stage to perform the sliding operation and the ion source to emit the ion beam to remove sputter particles adhered again to the sample in the first mode operation.

Ion milling device and milling processing method using same

Front surface of package

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Tokyo, Japan

Megumi Nakamura