Merck Patent Gmbh

Md S Rahman

Durairaj Baskaran

Hengpeng Wu

Jianhui Shan

JiHoon Kim

Sachin Bobade

One aspect of this invention is a novel functional polymer having a polydispersity from 1 to about 1.12 comprising at least one reactive moiety, selected from a moiety comprising at least one N-coordinative functional group having at least one lone pair of electrons, a moiety comprising a dialkylsilyl group, or a mixture of both groups, wherein said reactive moiety is present in said functional styrenic polymer either on a repeat unit, on an end group or on both, and said N-coordinative functional group is either a monodentate N-coordinative functional group, a polydendate N-coordinative group or a mixture of thereof, and said monodentate N-coordinative functional group is an azide moiety (—N) or a cyano moiety (—CN). Another aspect of this invention is the use of these novel polymer to selectively deposit a DSA directing layer on a metallic substrate.

Non-thiol nitrogen based hydrophobic polymer brush materials and use thereof for modification of substrate surfaces

The present invention relates to a novel styrenic polymer and to the novel composition comprised of this polymer and a solvent; wherein the styrenic polymer has a polydispersity from 1 to 1.3 and further wherein each polymer chain of the styrenic polymer is capped with one end group of structure 1), wherein, and L is a linking group selected from the group consisting of a direct valence bond, oxy (&#x2014;O&#x2014;), carbonyloxy, (&#x2014;(C&#x2550;O)&#x2014;O&#x2014;), carbonate (&#x2014;O&#x2014;(C&#x2550;O)&#x2014;O&#x2014;); Lis a C-1 to C-20 substituted or unsubstituted alkylene spacer, an arylene spacer or a direct valence bond, R, is hydrogen, a halide, a C-1 to C-20 alkyl moiety, or a C-1 to C-20 alkyloxy moiety, m is an integer from 1 to 3; and (I) represent the direct valence bond attaching the end group 1) to the end of the polymer chain of the styrenic polymer. In another aspect of this invention it pertains to the use of this composition to create self-assembly process. 

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Flemington, NJ, United States of America

Md S Rahman