Nxp Usa, Inc.

Freescale Semiconductor,inc.

Md M Hoque

Patrice M Parris

Weize Chen

Richard J De Souza

John M McKenna

Raymond Mervin Roop

Jose Fernandez Villasenor

David E Niewolny

Partice M Parris

Integrated circuit devices with counter-doped conductive gates. The devices have a semiconductor substrate that has a substrate surface. The devices also have a first well of a first conductivity type, a source of a second conductivity type, and a drain of the second conductivity type. A channel extends between the source and the drain. A conductive gate extends across the channel. The conductive gate includes a first gate region and a second gate region of the second conductivity type and a third gate region of the first conductivity type. The third gate region extends between the first and second gate regions. The devices further include a gate dielectric that extends between the conductive gate and the substrate and also include a silicide region in electrical communication with the first, second, and third gate regions. The methods include methods of manufacturing the devices.

Integrated circuits devices with counter-doped conductive gates

An embodiment of an Ion Sensitive Field Effect Transistor (ISFET) structure includes a substrate, source and drain regions formed within the substrate and spatially separated by a channel region, a gate dielectric and a gate formed over the channel region, multiple conductive structures overlying the surface of the substrate, and one or more protection diode circuits coupled between one or more of the multiple conductive structures and the substrate. The multiple conductive structures include a floating gate structure and a sense plate structure. The floating gate structure is formed over the gate dielectric and includes the gate. The sense plate structure is electrically coupled to the floating gate structure and is configured to sense a concentration of a target ion or molecule in a fluid adjacent to a portion of the sense plate structure.

Ion sensitive field effect transistors with protection diodes and methods of their fabrication

An ISFET includes a control gate coupled to a floating gate in a CMOS device. The control gate, for example, a poly-to-well capacitor, is configured to receive a bias voltage and effect movement of a trapped charge between the control gate and the floating gate. The threshold voltage of the ISFET can therefore by trimmed to a predetermined value, thereby storing the trim information (the amount of trapped charge in the floating gate) within the ISFET itself.

Methods and apparatus for an ISFET

Protected sensor field effect transistors (SFETs). The SFETs include a semiconductor substrate, a field effect transistor, and a sense electrode. The SFETs further include an analyte-receiving region that is supported by the semiconductor substrate, is in contact with the sense electrode, and is configured to receive an analyte fluid. The analyte-receiving region is at least partially enclosed. In some embodiments, the analyte-receiving region can be an enclosed analyte channel that extends between an analyte inlet and an analyte outlet. In these embodiments, the enclosed analyte channel extends such that the analyte inlet and the analyte outlet are spaced apart from the sense electrode. In some embodiments, the SFETs include a cover structure that at least partially encloses the analyte-receiving region and is formed from a cover material that is soluble within the analyte fluid. The methods include methods of manufacturing the SFETs.

Protected sensor field effect transistors

A mechanism is provided for enhancing the sensitivity of an ion-sensitive semiconductor device by creating a second gate coupled to a sense plate that can improve the amount of charge brought to the ion-sensitive semiconductor device conductivity modulated region (e.g., a channel region of an ISFET). This is accomplished by utilizing a buried dielectric layer associated with the ion-sensitive semiconductor device conductivity modulated region as the second gate dielectric. The buried dielectric layer is coupled to the sense plate using an isolated well region as a conductor that is coupled to metal layers extending to the sense plate. Some embodiments further use the buried dielectric layer as the sole gate dielectric for the semiconductor device, thereby allowing the traditional gate dielectric region to be coupled to a protection diode. This protection diode then protects the gate dielectric from plasma induced damage and electrostatic discharge.

Enhanced sensitivity ion sensing devices

Integrated circuit devices with counter-doped conductive gates

A differential pair sensing circuit () includes control gates () for separately programming a reference transistor () and a chemically-sensitive transistor () to a desired threshold voltage Vt to eliminate the mismatch between the transistors in order to increase the sensitivity and/or accuracy of the sensing circuit without increasing the circuit size.

Differential pair sensing circuit structures

An integrated circuit package for sensing fluid properties includes: a substrate made of semiconductor material; a fluid property measurement circuit formed on the substrate; and a sensor circuit coupled to the fluid property measurement circuit within a same integrated circuit package. The sensor circuit is configured to generate a field that interacts with the fluid. The fluid property measurement circuit is configured to determine a change in a property of the sensor circuit as results from the field interacting with the fluid and is further configured to determine a property of the fluid based on the change in the property of the sensor circuit.

Growing community of inventors

Gilbert, AZ, United States of America

Md M Hoque