Safeview, Inc.

Applied Materials, Inc.

L-3 Communications Security and Detection Systems Corporation

Maya M Radzinski

Thomas W Grudkowski

Michael Fleisher

Scott T Trosper

Raymond R Blasing

Richard L Rowe

Amos Dor

Edward Bromberg

Paul J Hurd

Michael J Lanzaro

Serge Nikulin

John J Reilly

Joseph Carter

Thomas W Trawick

Thomas E Breen

Paul J DeLia

A surveillance system is disclosed. In some embodiments, the surveillance system may include at least one controller adapted to control operation of first and second screening apparatus and to produce image data and screening data, to relate the image data to the screening data, and to produce relational information data from the related image data and screening data. In some embodiments, the system may include a first screening apparatus adapted to screen a subject in a subject position, a second screening apparatus adapted to screen the subject in the subject position, and a controller adapted to produce first and second screening data from the first and second screening apparatus, respectively, relate the first and second screening data, and to produce relational information data from the related first and second screening data.

Surveillance with subject screening

A surveillance system is disclosed. In some embodiments, the surveillance system may include at least one controller configured to receive information data from at least one upstream information source and to control operation of at least one controllable downstream information source based, at least in part, on the information data. A surveillance method also is disclosed. In some embodiments, the method may include analyzing screening data, obtaining information data, and reanalyzing the screening data based, at least in part, on the obtained information data.

Surveillance systems and methods with subject-related screening

A surveillance system can include a first sensor apparatus configured to interrogate a subject, including a person and objects carried by the person, with millimeter-wave electromagnetic radiation for imaging the subject. A supplemental source provides additional information about the subject that is relatable to objects potentially carried by the person. Relational information relates the produced image signal and the subject information. The supplemental source may be a second sensor apparatus adapted to detect a given characteristic of an object potentially carried by a person in the subject position. Relational information about whether the person is carrying an object having the given characteristic may then be produced.

Multi-source surveillance system

An imaging system can include an antenna apparatus configured to transmit toward and receive from a subject in a subject position, millimeter-wave electromagnetic radiation. A subject may include a person and any object or objects with the person. A controller can include a transceiver configured to operate the antenna apparatus and produce an output representative of the received radiation, and a processor adapted to produce from the transceiver output, image data representative of an image of the subject. At least a first portion of an image signal representative of radiation received by an antenna apparatus may be used to produce first image data representative of a first image of at least a portion of the subject. Second image data representative of a second image having resolution that is different than that of the first image may be produced from at least a second portion of the image signal.

Surveilled subject privacy imaging

Multi-sensor surveillance portal

Enhanced surveilled subject imaging

A method and associated apparatus for creating a defect knowledge library containing case study information of wafer defects on semiconductor wafers. The method comprises creating a database entry that contains a case study of a specific defect including defect information that comprises one or more defect images and storing the database entry for subsequent access. The database entries are stored on a server and are accessible by a plurality of clients.

Defect knowledge library

A method and apparatus for providing communication between a defect source identifier and a tool data collection and control system. The defect source identifier collects wafer data until a defect is identified. Upon identification of a defect, a request is sent to the tool data collection and control system to request data of the tool parameters at the time the defect occurred. The tool data collection and control system retrieves the tool parameters and communicates them to the defect source identifier through a network. The tool parameters are processed by the defect source identifier to extract certain wafer data. The selected wafer data is communicated to the tool data collection and control system and is used to execute a prediction model to predict failure possible of the tool elements.

Method and apparatus for providing communication between a defect source identifier and a tool data collection and control system

A method and associated apparatus of analyzing defects on semiconductor wafers. The method includes identifying defects on the semiconductor wafer. Defect inspection information is created within a defect source identifier client. The defect inspection information containing information regarding the identified defects. The defect inspection information is transmitted through a network to a defect source identifier server. Defect source information is derived at the defect source identifier server in response to the defect inspection information. The defect source information is transmitted from the defect source identifier server to the defect source identifier client. The defect source information is utilized at the defect source identifier client. In one aspect, the utilizing the defect solution information involves displaying defect solutions to the defect at the defect source identifier client in response to the defect solution information. In another aspect, utilizing the defect solution information involves altering the operation of the wafer processing system.

Defect source identifier

Growing community of inventors

Palo Alto, CA, United States of America

Maya M Radzinski