Fei Comapny

Maximus Theodorus Otten

Jason Harrison Arjavac

David James Tasker

Pei Zou

Gerhard Daniel

Joeri Lof

Gerrit Cornelis Van Hoften

Martin Verheijen

Abigaël Adriana Maria Kok

An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (&#x3c;100 nm thick) TEM lamellae. Preferred embodiments of the present invention also provide an in-line process for S/TEM based metrology on objects such as integrated circuits or other structures fabricated on semiconductor wafer by providing methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis.

Method for S/TEM sample analysis

A method of calibrating a Scanning Transmission Charged-Particle Microscope, operable in

Method of calibrating a scanning transmission charged-particle microscope

The invention relates to a Method of protecting a direct electron detector () in a TEM. The invention involves predicting the current density on the detector before setting new beam parameters, such as changes to the excitation of condenser lenses (), projector lenses () and/or beam energy. The prediction is made using an optical model or a Look-Up-Table. When the predicted exposure of the detector is less than a predetermined value, the desired changes are made, otherwise a warning message is generated and changes to the settings are postponed.

Method of protecting a radiation detector in a charged particle instrument

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Maximus Theodorus Otten