Applied Materials Israel Limited

Carl Zeiss Microscopy Gmbh

Other

Carl-zeiss-smt Ag

Ceos Corrected Electron Optical Systems Gmbh

Applied Materials Isreal Ltd

Carl Ziess Smt Ag

Carl Zeiss Smt Gmbh

Maximilian Haider

Stephan Uhlemann

Rainer K Knippelmeyer

Thomas Kemen

Oliver Kienzle

Antonio Casares

Heiko Mueller

Steven Robert Rogers

Heiko Müller

A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.

The invention relates to an electron/ion gun for electron or ion beams, including a beam source and a monochromator. According to the invention, the monochromator is equipped with an additional beam guidance system and a switchover element which are provided at the input of the monochromator, and which convey the particles coming from the beam source to either the monochromator or the rest of the beam guidance system.

Electron/ion gun for electron or ion beams with high monochromasy or high current density

The invention relates to a method for eliminating axial image deformations &agr; in electron optical systems, where the extra-axial image deformation of the order n&plus;m with the same behavior in &agr; , which thus has the form &agr; &ggr; , is modified by shifting or tilting the beam path towards the optical axis until compensation of the axial image deformation has been achieved, whereby &ggr; describes the extra-axial image coordinate as a complex number in both sections. The invention also relates to an adjustment method for eliminating all first-, second- and third-order axial image deformations during correction of the third-order spherical aberration in electron optical systems with hexapoles.

Method for eliminating first, second and third-order axial image deformations during correction of the third-order spherical aberration in electron optical systems

A device for correcting third-order spherical aberration in the objective lens of an electron microscope, including an objective lens and a correction device which is formed by two hexapoles and a round-lens doublet arranged therebetween having two round lenses with the same focal length, whereby a single round lens ( ) is arranged between the objective lens ( ) and the correction device ( ) in such a way that a parallel optical path hits the correction device ( ) and the coma-free plane ( ) of the objective lens is represented on the plane of the first hexapole ( ) of the correction device ( ) or two round lenses with different focal lengths are arranged between the objective lens and the correction device, whereby the distance between the round lens ( ) close to the objective and the coma-free plane ( ) of the objective and the distance between the round lens ( ) close to the correction device and the coma-free plane ( ) of the correction device is the same is terms of focal length and the distance between both round lenses ( ) is equal to the sum of their focal lengths.

Device for correcting third-order spherical aberration in a lens, especially the objective lens of an electronic microscope

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Gaiberg, Germany

Maximilian Haider