Asml Netherlands B.v.

Maxime Biron

Pieter-Jan Van Zwol

Paul Janssen

Jan Hendrik Willem Kuntzel

Johan Hendrik Klootwijk

Arnoud Willem Notenboom

Maxim Aleksandrovich Nasalevich

Adrianus Johannes Maria Giesbers

Dennis De Graaf

Ties Wouter Van Der Woord

Michael Alfred Josephus Kuijken

Thijs Kater

Kevin Kornelsen

Guido Salmaso

Anne-Sophie Rollier

Richard Beaudry

Stephane Martel

Inci Donmez Noyan

Lourdes Ferre Llin

A method of manufacturing a pellicle membrane, the method including: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly having a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus including such a pellicle.

Pellicle membrane

A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.

Pellicle for EUV lithography

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Bromont, Canada

Maxime Biron