Vishay General Semiconductor, Inc.

General Semiconductor, Inc.

Via Technologies, Inc.

General Semiconductor of Taiwan, Ltd.

General Semiconductor Taiwan, Ltd.

Max Sk Chen

Kevin Lu

Warren Chiang

Benson Wang

Fwu-Iuan Hshieh

Koon Chong So

Yan Man Tsui

Ching Lu Hsu

Kuang Hann Lin

Yan-Man Tsui

Yih-Yin Lin

Chih Wei Hsu

A planar diode and method of making the same employing only one mask. The diode is formed by coating a substrate with an oxide, removing a central portion of the oxide to define a window through which dopants are diffused. The substrate is given a Ni/Au plating to provide ohmic contact surfaces, and the oxide on the periphery of the window is coated with a polyimide passivating agent overlying the P/N junction.

Process for forming a planar diode using one mask

A semiconductor device includes a substrate having first and second sides and a first active layer disposed over the first side of the substrate. A second active layer is disposed on the first active layer. The second active layer has a higher bandgap than the first active layer such that a two-dimensional electron gas layer arises between the first active layer and the second active layer. At least one trench extends through the first and second active layers and the two-dimensional electron gas layer and into the substrate. A conductive material lines the trench. A first electrode is disposed on the second active layer and a second electrode is disposed on the second side of the substrate.

Gallium nitride power semiconductor device having a vertical structure

A semiconductor device includes a semiconductor substrate having a first type of conductivity. A first layer is formed on the substrate having the first type of conductivity and is more lightly doped than the substrate. At least one trench is formed in the first layer. A dielectric layer lines the bottom surface and the sidewalls of the trench. A conducting material fills the trench. A lightly doped region is formed in the first layer having the second conductivity type. The lightly doped region is disposed below the bottom surface of the trench. A metal layer is disposed over the first layer and the conducting material. A first electrode is formed over the metal layer and a second electrode is formed on a backside of the substrate.

Trench-based device with improved trench protection

A method for playing DVD. A method for simultaneously outputting a DVD movie to multiple channels each having its own playback parameters such as view angle, spoken language and subtitle language, using a single DVD player.

Multiplex DVD player

The present invention provides a semiconductor device packaging assembly and method for manufacturing the assembly. Preferably, the method of the present invention is used to assemble a plurality of semiconductor chips, such that the throughput of assembly can be enhanced. The method comprises the steps of: providing a bottom frame matrix including a plurality of bottom frame units, each of which unit comprises a bottom supporting portion and a bottom frame portion; providing a bridge frame including a plurality of bridge frame units, each of which unit comprises a bridge frame portion and a plurality of conducting bars; placing each of the semiconductor chips on each of the bottom supporting portions, respectively; and bonding each bottom frame unit and each bridge frame unit together, wherein, the conducting bars extending from each bridge frame portion toward corresponding chips are electrically coupled to bonding areas of the corresponding chips.

Method for assembling a semiconductor chip utilizing conducting bars rather than bonding wires

A Schottky rectifier is provided. The Schottky rectifier comprises: (a) a semiconductor region having first and second opposing faces, with the semiconductor region comprising a cathode region of first conductivity type adjacent the first face and a drift region of the first conductivity type adjacent the second face, and with the drift region having a lower net doping concentration than that of the cathode region; (b) one or more trenches extending from the second face into the semiconductor region and defining one or more mesas within the semiconductor region; (c) an insulating region adjacent the semiconductor region in lower portions of the trench; (d) and an anode electrode that is (i) adjacent to and forms a Schottky rectifying contact with the semiconductor at the second face, (ii) adjacent to and forms a Schottky rectifying contact with the semiconductor region within upper portions of the trench and (iii) adjacent to the insulating region within the lower portions of the trench.

Trench schottky rectifier

The present invention provides a semiconductor device packaging assembly and method for manufacturing the assembly. Preferably, the method of the present invention is used to assemble a plurality of semiconductor chips, such that the throughput of assembly can be enhanced, by providing a bottom frame matrix including a plurality of bottom frame units, each of which unit includes a bottom supporting portion and a bottom frame portion; providing a bridge frame including a plurality of bridge frame units, each of which unit includes a bridge frame portion and a plurality of conducting bars; placing each of the semiconductor chips on each of the bottom supporting portions, respectively; and bonding each bottom frame unit and each bridge frame unit together, wherein, the conducting bars extending from each bridge frame portion toward corresponding chips are electrically coupled to bonding areas of the corresponding chips.

Growing community of inventors

Taipei, Taiwan

Max Sk Chen