Ciba-Geigy Corporation

Ciba Specialty Chemicals Corporation

Ciba-Geigy Ag

Atotech Deutschland Gmbh

Huntsman Advanced Materials Americas LLC

Vantico Limited

Max Hunziker

Adrian Schulthess

Bettina Steinmann

Jean-Pierre Wolf

Manfred Hofmann

Rolf Wiesendanger

Bernd Klingert

Paul Bernhard

Edward Irving

Carl W Mayer

Kurt Dietliker

Beat Muller

Godwin Berner

Werner Rutsch

Bruno Hilti

Christopher G Demmer

Jurgen Pfeiffer

Michel Probst

Jurgen Herbert

Alex Bruderer

Method for producing a plastic layer having a layer thickness of less than 200 &#x3bc;m on an upper side of a substrate includes the following steps:

Method and device for producing a plastic coating

A photosensitive composition of (a) a compound of formula (Ia) or (Ib) and (b) a bifunctional acrylate or methacrylate.

Photosensitive diacrylate and dimethacrylate compositions

Diacrylates and dimethacrylates

Compounds of formulae (Ia) and (Ib) ##STR1## wherein the substituents R.sub.1 are each independently of the other hydrogen or methyl, R.sub.2 is an unsubstituted C.sub.1 -C.sub.20 alkyl group or a C.sub.1 -C.sub.20 alkyl group which is substituted by one or more than one substituent selected from the group consisting of hydroxy, C.sub.6 -C.sub.14 aryl and halogen, an unsubstituted phenyl group or a phenyl group which is substituted by one or more than one substituent selected from the group consisting of C.sub.1 -C.sub.6 alkyl, hydroxy or halogen, or is a radical of formula --CH.sub.2 --OR.sub.3, wherein R.sub.3 is an unsubstituted C.sub.1 -C.sub.20 alkyl group or a C.sub.1 -C.sub.20 alkyl group which is substituted by one or more than one substituent selected from the group consisting of hydroxy, C.sub.6 -C.sub.14 aryl and halogen, an unsubstituted phenyl group or a phenyl group which is substituted by one or more than one substituent selected from the group consisting of C.sub.1 -C.sub.6 alkyl, hydroxy and halogen, or is a C.sub.2 -C.sub.6 alkenyl group, a C.sub.2 -C.sub.20 acyl group or an unsubstituted cyclohexylcarbonyl group or a cyclohexylcarbonyl group which is substituted by one or more than one substituent selected from the group consisting of C.sub.1 -C.sub.6 alkyl, hydroxy and halogen, Z is a group of formulae (IIa)-(IIe) ##STR2## wherein Y is a direct bond, C.sub.1 -C.sub.6 alkylene, --S--, --O--, --SO--, --SO.sub.2 -- or --CO--, and R.sub.1 is hydrogen or methyl, and wherein the aromatic and cycloaliphatic rings of formulae (IIa)-(IIe) are unsubstituted or substituted by one or more than one substituent selected from the group consisting of C.sub.1 -C.sub.6 alkyl, chloro and bromo, form, in conjunction with other acrylates or methacrylates, low viscosity photocurable compositions which, when fully cured, give moulded articles of excellent flexibility.

The invention relates to compounds having at least one vinyl ether group which also contain in the molecule at least one further functional group selected from acrylate, methacrylate, epoxy, alkenyl, cycloalkenyl and vinylaryl groups, to compositions, especially for stereolithography, comprising those vinyl ether compounds, and to a method of producing three-dimensional objects using those compositions.

Vinyl ether compounds having additional functional groups other than

Novel (meth)acrylates which also contain urethane groups and other polymerizable groups in one and the same molecule and can be polymerized either by means of free radicals and/or cationically are used for the production of coatings, adhesives, photoresists, solder masks or in stereolithography. The mouldings produced therefrom contain a coherent, homogeneous network and have high strength properties, in particular mechanical properties.

(Meth)acrylates containing urethane groups

A process is described for the preparation of photopolymerizable compositions, wherein the photopolymerizable compositions can be photopolymerized by the irradiation of emission lines of differing wavelength from a UV/VIS laser light source, and contain a photopolymerizable compound and at least two photoinitiators, by adjusting the sensitivity to radiation. The ratio between the concentrations of the individual photoinitiators is so adjusted that the composition has virtually the same optical density for the radiation of the different emission lines at which the photoinitiators are effective.

Process for adjusting the sensitivity to radiation of photopolymerizable

Liquid radiation-curable formulation, in particular for stereolithography, based on at least one compound that contains radically polymerizable groups, and at least one photoinitiator suitable for the polymerization, which formulation additionally contains a polyoxyalkylene-polysiloxane block copolymer that is selected from copolymers of the chemical formulae ##STR1## wherein: R.sup.1 is a hydrogen atom or a C.sub.1 -C.sub.8 alkyl group;

Liquid radiation-curable formulation, in particular for use in

Novel (cyclo)aliphatic epoxy compounds that contain at least one acrylate group in the molecule and at least one cycloaliphatic epoxy group can be used for the production of coating formulations, adhesives, photoresists or in stereolithography. As they contain a cohesive homogeneous network, the three-dimensional objects produced have very good green strength and very good strength properties.

(Cyclo)aliphatic epoxy compounds

Novel (meth)acrylates containing urethane groups Novel (meth)acrylates which also contain urethane groups and other polymerizable groups in one and the same molecule and can be polymerized either by means of free radicals and/or cationically are used for the production of coatings, adhesives, photoresists, solder masks or in stereolithography. The mouldings produced therefrom contain a coherent, homogeneous network and have high strength properties, in particular mechanical properties.

Photosensitive compositions

The invention relates to photosensitive compositions comprising

Growing community of inventors

Dudingen, Switzerland

Max Hunziker