Carl-zeiss-smt Ag

Carl Zeiss Nts Gmbh

Max Haider

Rainer K Knippelmeyer

Stephan Uhlemann

Oliver Kienzle

Heiko Müller

Michael Steigerwald

Dirk Stenkamp

An electron microscopy system comprises an objective lens () which images a field displaceable in x-direction on a fixed beam axis (). The objective lens has an astigmatic effect which is compensated for by a beam shaper () on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.

Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system

An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the field, the field being displaceable in the plane of the object, a first deflector for providing a variable deflection field for guiding charged particles emerging from locations of a selectable region of the object through a fixed, predetermined beam cross-section, and a position-sensitive detector disposed in the beam path such that the charged particles, after having passed through the first deflector, impinge on the position-sensitive detector, wherein particles emerging from different locations of the region are imaged on different locations of the position-sensitive detector which are allocated to the locations of emergence.

Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same

Growing community of inventors

Gaiberg, Germany

Max Haider