Fuji Photo Film B.v.

Fujifilm Manufacturing Europe B.v.

Technische Universiteit

Technische Universiteit Eindhoven

Mauritius Cornelius Maria Van De Sanden

Eugen Aldea

Hindrik De Vries

Jan Bastiaan Bouwstra

Fuyuhiko Mori

Hindrik Willem DeVries

Paul Peeters

Serguei Alexandrovich Starostine

Hindrik Willem De Vries

Daniel C Schram

Edward Aloys Gerard Hamers

Yoichiro Kamiyama

Arno Hendrikus Marie Smets

Mariadriana Creatore

Hubertus Theresia Jozef Maria Hintzen

A method and apparatus for manufacturing a multi-layer stack structure (), the structure () comprising in order: a substrate () a barrier layer () an adhesive layer () a barrier layer () a substrate (). The method comprises: a) providing two substrates () in a single treatment space (), the treatment space () comprising at least two electrodes () for generating an atmospheric pressure glow discharge plasma in the treatment space (); b) treating the facing surfaces of the two substrates () simultaneously in the single treatment space (); c) laminating the two treated substrates () with an adhesive layer () in between the facing surfaces to obtain the multi-layer stack structure ().

Method for manufacturing a multi-layer stack structure with improved WVTR barrier property

Disclosed are methods for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space comprising two electrodes connected to a power supply for providing electrical power during an on-time (t). The treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition in the treatment space. Best results are obtained when using a stabilized plasma.

Method for deposition using pulsed atmospheric pressure glow discharge

The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented.

Method of and arrangement for removing contaminants from a substrate surface using an atmospheric pressure glow plasma

Method and apparatus for generating and sustaining a glow discharge plasma in a plasma discharge space comprising at least two spaced electrodes. The method and apparatus are arranged for performing the steps of introducing in the discharge space a gas or gas mixture under atmospheric pressure conditions, energizing the electrodes by applying an AC energizing voltage (V) to the electrodes, and controlling the energizing voltage (V) such that at plasma generation a sharp relative decrease of displacement current is provided.

Method and apparatus for stabilizing a glow discharge plasma under atmospheric conditions

The present invention provides an arrangement and method for generating a uniform and stable plasma. The arrangement comprises a discharge space () between at least a pair of electrodes (), which electrodes () are arranged for providing an electric field and for generating a plasma in the electric field. At least one of the electrodes () has a boundary surface () with the discharge space (). The boundary surface is comprised of one or more alternately arranged conductive () and insulating regions (). The invention further relates to an electrode () for use in the arrangement described. The invention may, for example, be used in dielectric barrier discharge configurations, or in arrangements for generating plasmas at atmospheric pressures, or for generating plasmas at low temperatures, such as generating atmospheric pressure glow plasmas (APG) for material processing or surface () treatment purposes.

Arrangement, method and electrode for generating a plasma

Method and arrangement () for generating an atmospheric pressure glow plasma APG (), where in a plurality of electrodes, () are arranged defining a discharge space () for forming said plasma (). The electrodes () are connected to a power supply () providing an AC-voltage having a frequency of at least 50 kHz to the electrodes (). A gaseous substance () is provided in said discharge space and comprises t least one of a group of argon, nitrogen and air.

Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG)

The present invention is directed to a method and arrangement for controlling a glow discharge plasma in a gas or gas mixture under atmospheric conditions, in a plasma discharge space comprising at least two spaced electrodes in which at least one plasma pulse having an absolute pulse maximum is generated by applying an AC plasma energizing voltage to the electrodes causing a plasma current and a displacement current. The plasma is controlled by providing a relative decrease of the displacement current after the pulse maximum. In a preferred embodiment, the energizing voltage is applied through a series circuit including a choke coil and a non-saturable inductor.

Method and arrangement for controlling a glow discharge plasma under atmospheric conditions

Method for generating an atmospheric pressure glow plasma (APG), wherein said plasma is generated in a discharge space between a plurality of electrodes. A dielectric is present on at least one of said electrodes, said dielectric having a boundary surface with said plasma enabling interactions between said plasma and said surface. Said dielectric is arranged for releasing electrons contributing to said plasma from said surface by said interactions.

Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)

In a process and device for depositing an at least partially crystalline silicon layer a plasma is generated and a substrate () is exposed under the influence of the plasma to a silicon-containing source fluid for deposition of silicon therefrom. A pressure drop is applied between a location () where the source fluid is supplied and the substrate (). In addition to the source fluid an auxiliary fluid is also injected which is able to etch non-crystalline silicon atoms. The substrate () is exposed to both the source fluid and the auxiliary fluid.

Process and device for the deposition of an at least partially crystalline silicium layer on a substrate

Apparatus for producing and sustaining a glow discharge plasma in a plasma discharge space comprising at least two oppositely spaced electrodes, means for supplying a gas or a gas mixture under atmospheric pressure conditions in the discharge space, AC power supply means for energizing the electrodes, and electric stabilisation means for stabilizing current variations in the plasma. The stabilisation means connect between the electrodes and the power supply means, and are arranged for providing a negative feedback opposed to a positive feedback of the plasma to instabilities in the plasma.

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Tilburg, Netherlands

Mauritius Cornelius Maria Van De Sanden