Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

Asm International N.v.

Otb Group B.v.

Mauritius Cornelis Maria Van De Sanden

Joannes Leonard Linden

Gregory Robert Alcott

Franciscus Cornelius Dings

Wilhelmus Mathijs Marie Kessels

Martin Dinant Bijker

Michael Adrianus Theodorus Hompus

Edward Aloys Gerard Hamers

Mariadriana Creatore

The present invention describes a method for manufacturing a low dielectric constant coating, which coating comprises an inorganic and an organic component, wherein precursors for these components are activated in at least two plasma sources for plasma activated deposition of a chemical vapor phase and wherein said activated precursors are combined before they are deposited from the chemical vapor phase on the substrate to form the coating, characterized in that said inorganic component comprises porous nanoparticles. The invention also describes a device for the manufacture of a low dielectric constant coating.

Coatings, and methods and devices for the manufacture thereof

The present invention describes a method for applying a hybrid coating to a substrate. A coating according to the invention is formed by an inorganic component and an organic component. As a result, this coating has the hybrid character whereby the advantages of inter alia hardness are combined with flexibility. The invention also describes a device for the manufacture of a hybrid coating.

Method for depositing inorganic/organic films

A method for the passivation of a semiconductor substrate, wherein a SiN:H layer is deposited on the surface of the substrate () by means of a PECVD process comprising the following steps:

Method for passivating a semiconductor substrate

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Tilburg, Netherlands

Mauritius Cornelis Maria Van De Sanden