Asml Netherlands B.v.

Maurice Willem Jozef Etiënne Wijckmans

Hans Butler

Cornelius Adrianus Lambertus De Hoon

Jeroen Pieter Starreveld

Christiaan Alexander Hoogendam

Robertus Johannes Marinus De Jongh

Erik Roelof Loopstra

Marc Wilhelmus Maria Van Der Wijst

Adrianus Hendrik Koevoets

Robertus Leonardus Tousain

Martinus Van Duijnhoven

Bernardus Antonius Johannes Luttikhuis

Michael Jozef Mathijs Renkens

Martinus Agnes Willem Cuijpers

Fransiscus Mathijs Jacobs

Bastiaan Stephanus Hendricus Jansen

Joep Sander De Beer

Ronald Petrus Hendricus Faassen

Pavel Kagan

Engelbertus Antonius Fransiscus Van Der Pasch

Timotheus Franciscus Sengers

Franciscus Johannes Joseph Janssen

Jan Bernard Plechelmus Van Schoot

Antonius Johannes Josephus Van Dijsseldonk

Dominicus Jacobus Petrus Adrianus Franken

Leon Martin Levasier

Wilhelmus Franciscus Johannes Simons

Wilhelmus Petrus De Boeij

Jan Frederik Hoogkamp

Petrus Rutgerus Bartray

Josephus Jacobus Smits

Hendrikus Herman Marie Cox

Maarten Hartger Kimman

Olof Martinus Josephus Fischer

Peter Gerardus Jonkers

Michael Johannes Vervoordeldonk

Johannes Bernardus Ridder

Dennis Jozef Maria Paulussen

Dave Braaksma

Stephan Christiaan Quintus Libourel

Eric Pierre-Yves Vennat

René Wilhelmus Antonius Hubertus Leenaars

Theodorus Mattheus Joannus Maria Huizinga

Rogier Herman Mathijs Groeneveld

Johannes Marinus Maria Rovers

Björn Hubertus Maria Bukkems

Anthonie Aantjes

Hugues Poincelin

Fransiscus Theresia Noel Heusschen

A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.

Frame assembly, lithographic apparatus and device manufacturing method

The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.

Pneumatic support device and lithographic apparatus with pneumatic support device

The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator. The magnetic gravity compensator comprises: a first permanent magnet assembly mounted to one of the first part and the second part and comprising at least a first column of permanent magnets, the first column extending in the vertical direction, wherein the permanent magnets have a polarization direction in a first horizontal direction or in a second horizontal direction opposite to the first horizontal direction, wherein vertically adjacent permanent magnets have opposite polarization directions, a second permanent magnet assembly mounted to the other of the first part and the second part and comprising at least one other column of permanent magnets, the at least one other column extending in the vertical direction, wherein vertically adjacent permanent magnets of the at least one other column have opposite polarization directions in the first horizontal direction or the second horizontal direction, wherein the first permanent magnet assembly at least partially encloses the second permanent magnet assembly.

Bearing device, magnetic gravity compensator, vibration isolation system, lithographic apparatus, and method to control a gravity compensator having a negative stiffness

The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.

Positioning device, lithographic apparatus, method for compensating a balance mass torque and device manufacturing method

The present invention relates to a lithographic apparatus, comprising:

Lithographic apparatus, lithographic projection apparatus and device manufacturing method

A lithographic apparatus is described, the apparatus comprising:

Lithographic apparatus and device manufacturing method

The present invention relates to a lithographic apparatus, comprising: &#x2014;a primary frame () which is provided with a functional unit (), &#x2014;a secondary frame (), &#x2014;a primary frame support (), which is adapted to support the primary frame onto the secondary frame, &#x2014;a flexible utility connection (), adapted to connect the functional unit to an auxiliary system (), &#x2014;a vibration isolation body () having a body mass, which is moveably connected to the secondary frame by a flexible passive body support () having a body support stiffness, wherein the flexible utility connection is fixed to the vibration isolation body at a distance from the primary frame.

The invention relates to a vibration isolator, comprising:

Vibration isolator, lithographic apparatus and device manufacturing method

A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.

Lithographic apparatus having an active base frame support

A lithographic apparatus is described, the lithographic apparatus comprising:

A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (); a projection system (PS), comprising a first frame (); a second frame (); a supporting frame () for supporting the positioning stage; a first vibration isolation system () and a second vibration isolation system (), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system () to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.

A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle () configured to direct a stream of fuel droplets along a trajectory () towards a plasma formation location (). The radiation source is configured to receive a first amount of radiation () such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location. The first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation (). The radiation source further comprises an alignment detector having a first sensor arrangement () and a second sensor arrangement (). The first sensor arrangement is configured to measure a property of a third amount of radiation () that is indicative of a focus position of the first amount of radiation. The second sensor arrangement is configured to measure a property of a fourth amount of radiation (), the fourth amount of radiation being a portion of the first amount of radiation that is reflected by the fuel droplet upon which the first amount of radiation is incident.

Radiation source

A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (). The position of the optical elements is measured relative to a second frame () using a first measurement system (). A second measurement system () is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system () may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

Projection system and lithographic apparatus

A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

Positioning system, lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

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Eindhoven, Netherlands

Maurice Willem Jozef Etiënne Wijckmans