Asml Netherlands B.v.

Maurice Martinus Johannes Van Der Lee

Hans Jansen

Gheorghe Tanasa

Richard Joseph Bruls

Marcio Alexandre Cano Miranda

Ivo Adam Johannes Thomas

Bauke Jansen

Siebe Landheer

Laurentius Catrinus Jorritsma

Jeroen Peter Johannes Bruijstens

Arnout Johannes Meester

Lambertus Dominicus Noordam

Jeroen Johannes Sophia Maria Mertens

Martinus Hendrikus Antonius Leenders

Johannes Henricus Wilhelmus Jacobs

Youri Johannes Laurentius Maria Van Dommelen

Jimmy Matheus Wilhelmus Van De Winkel

Peter Paul Steijaert

Robert Douglas Watso

Joao Paulo Da Paz Sena

Henricus Martinus Dorotheus Van Lier

Anthonius Martinus Cornelis Petrus De Jong

Antonius Martinus Cornelis Petrus De Jong

A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Lithographic apparatus and a method of operating the apparatus

A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.

Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure

Growing community of inventors

Eindhoven, Netherlands

Maurice Martinus Johannes Van Der Lee