Asml Netherlands B.v.

Matthijs Cox

Patricius Aloysius Jacobus Tinnemans

Franciscus Godefridus Casper Bijnen

Hakki Ergün Cekli

Edo Maria Hulsebos

Ralph Brinkhof

Henricus Johannes Lambertus Megens

Maikel Robert Goosen

Weitian Kou

Willem Seine Christian Roelofs

Hadi Yagubizade

Loek Johannes Petrus Verhees

Manouk Rijpstra

Wendy Johanna Martina Van De Ven

Ahmet Koray Erdamar

Tran Thanh Thuy Vu

Boris Menchtchikov

Sudharshanan Raghunathan

Maaike Van't Westeinde

Youping Zhang

Yi Zou

Yana Cheng

Chenxi Lin

Cyrus Emil Tabery

Maxime Philippe Frederic Genin

Simon Philip Spencer Hastings

Nicolaas Petrus Marcus Brantjes

Maaike Van T Westeinde

Maxim Philippe Frederic Genin

Hakki Ergun Cekli

A method for determining a correction relating to a performance metric of a semiconductor manufacturing process, the method including: obtaining a set of pre-process metrology data; processing the set of pre-process metrology data by decomposing the pre-process metrology data into one or more components which: a) correlate to the performance metric; or b) are at least partially correctable by a control process which is part of the semiconductor manufacturing process; and applying a trained model to the processed set of pre-process metrology data to determine the correction for the semiconductor manufacturing process.

Method for controlling a manufacturing process and associated apparatuses

A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.

Lithographic method

A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method including: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.

A method for determining one or more optimized values of an operational parameter of a sensor system configured to measure a property of a substrate is disclosed. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameter values for the plurality of substrates using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameter values; and determining the one or more optimized values of the operational parameter based on the comparing.

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Valkenswaard, Netherlands

Matthijs Cox