Evonik Degussa Gmbh

Matthias Patz

Stephan Wieber

Harald Stueger

Jutta Hessing

Stephan Traut

Michael Coelle

Janette Klatt

Christoph Walkner

Odo Wunnicke

Bernhard Stuetzel

Joachim Erz

Miriam Deborah Malsch

Paul Henrich Woebkenberg

Hartwig Rauleder

Ekkehard Mueh

Patrik Stenner

Martin Trocha

Nicole Brausch

Harald Stüger

Reinhard Carius

Christoph Mader

Jasmin Lehmkuhl

Stephan Herrmann

Ekkehard Müh

Michael Cölle

Torsten Bronger

Paul Henrich Wöbkenberg

Paul Henrich WÖBKENBERG

Michael CÖLLE

The present invention relates to formulations comprising at least one hydridosilane of the generic formula SiHwith n=3-6 and at least one hydridosilane oligomer, to processes for preparation thereof and to the use thereof.

Formulations comprising hydridosilanes and hydridosilane oligomers, their process of manufacture and their use

The present invention relates to formulations comprising at least one hydridosilane of the generic formula SiHwith n=7-10 and at least one hydridosilane oligomer, to processes for preparation thereof and to the use thereof.

The present invention relates to compositions comprising at least one hydridosilane of the generic formula SiHwith n&#x2265;5 and m=(2n) and (2n+2) and at least one compound of the formula HB (OR)with R=C-C-alkyl, C-C-aryl, C-C-aralkyl, halogen, n=0, 1, 2, to processes for preparation thereof and use thereof.

Doped hydridosilane compositions, and method for producing same

The present invention relates to a liquid-phase process for producing structured silicon- and/or germanium-containing coatings by the application to a substrate of at least one coating composition, the partial activation of the resulting coating on the coated substrate, and oxidation of non-activated coating on the substrate, to the coats produced by the process and to their use.

Process for producing structured coatings

The invention relates to a process for preparing higher halosilanes by disproportionation of lower halosilanes. The invention further relates to a process for preparing higher hydridosilanes from the higher halosilanes prepared by disproportionation. The invention further relates to mixtures containing at least one higher halosilane or at least one higher hydridosilane prepared by the process described. Finally, the invention relates to the use of such a mixture containing at least one higher hydridosilane for producing electronic or optoelectronic component layers or for producing silicon-containing layers.

Process for preparing higher halosilanes and hydridosilanes

The present invention provides processes for preparing carbon-containing hydridosilanes, in which an optionally boron- or phosphorus-doped hydridosilane is reacted without catalyst and reducing agent with at least one carbon source selected from linear, branched or cyclic carbosilanes, halogenated hydrocarbons, carbenes, alkyl azides, diazomethane, dimethyl sulphate or alcohols, the carbon-containing hydridosilane oligomers obtainable by the process and the use thereof.

Method for producing hydrosilanes containing carbon

The invention relates to a process for producing p-doped silicon layers, especially those silicon layers which are produced from liquid silane-containing formulations. The invention further relates to a substrate coated with a p-doped silicon layer. The invention additionally relates to the use of particular dopants based on boron compounds for p-doping of a silicon layer.

p-Doped silicon layers

The invention relates to a liquid-phase method for the thermal production of silicon layers on a substrate, wherein at least one higher silicon that can be produced from at least one hydridosilane of the generic formula SiH(with a=3-10) being applied to a substrate and then being thermally converted to a layer that substantially consists of silicon, the thermal conversion of the higher silane proceeding at a temperature of 500-900&#xb0; C. and a conversion time of &#x2266;5 minutes. The invention also relates to silicon layers producible according to said method and to their use.

Method for producing silicon layers

The invention relates to a formulation which contains at least one silane and at least one carbon polymer in a solvent, and to the production of a silicon layer on a substrate which is coated with such a formulation.

Silicon layers formed from polymer-modified liquid silane formulations

The invention relates to a method for producing hydridosilanes from halosilanes by a) reacting i) at least one halosilane of the generic formula SiX(with n&#x2267;3 and X&#x2550;F, Cl, Br and/or I) with ii) at least one catalyst of the generic formula NRR'R&#x2033;Ywith a=0 or 1, b=0 or 1, and c=0 or 1, and formula (I), wherein aa) R, R' and/or R&#x2033; are &#x2014;C-Calkyl, &#x2014;C-Caryl, &#x2014;C-Caralkyl, &#x2014;C-Caminoalkyl, &#x2014;C-Caminoaryl, &#x2014;C-Caminoaralkyl, and/or two or three groups R, R&#x2032; and R&#x2033; (if c=0) together form a cyclic or bicyclic, heteroaliphatic or heteroaromatic system including N, with the proviso that at least one group R, R&#x2032; or R&#x2033; is unequal &#x2014;CHand/or wherein bb) R and R&#x2032; and/or R&#x2033;' (if c=1) are &#x2014;C-Calkylene, &#x2014;C-Carylene, &#x2014;C-Caralkylene, &#x2014;C-Cheteroalkylene, &#x2014;C-Cheteroarylene, &#x2014;C-Cheteroaralkylene and/or &#x2014;N&#x2550;, or cc) (if a=b=c=0) R&#x2550;&#x2261;C-R&#x2032;&#x2033; (with R&#x2032;&#x2033;&#x2550;&#x2014;C-Calkyl, &#x2014;C-Caryl and/or &#x2014;C-Caralkyl), while forming a mixture comprising at least one halosilane of the generic formula SiX(with m&#x3e;n and X&#x2550;F, Cl, Br and/or I) and SiX(with X&#x2550;F, Cl, Br and/or I), and b) hydrogenating the at least one halosilane of the generic formula SiHwhile forming a hydridosilane of the generic formula SiH. The invention also relates to the hydridosilanes producible according to said method and to their use.

Method for producing hydridosilanes

The present invention relates to a method for oligomerizing hydridosilanes, wherein a composition comprising substantially at least one non-cyclic hydridosilane having a maximum of 20 silicon atoms as the hydridosilane is thermally converted at temperatures below 235&#xb0; C. in the absence of a catalyst, the oligomers that can be produced according to the method, and the use thereof.

Method for oligomerizing hydridosilanes, the oligomers that can be produced by means of the method, and the use thereof

The present invention relates to a rapid and metal-free process for preparing high order hydridosilane compounds from low order hydridosilane compounds, wherein at least one low order hydridosilane compound (I) is thermally reacted in the presence of at least one hydridosilane compound (II) having a weight average molecular weight of at least 500 g/mol, to the hydridosilane compounds obtainable by the process and to their use.

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Bottrop, Germany

Matthias Patz