Heptagon Micro Optics Pte. Ltd.

Ams Sensors Singapore Pte. Ltd.

Matthias Maluck

Peter Roentgen

Hartmut Rudmann

Markus Rossi

Alexander Bietsch

Stephan Heimgartner

The wafer stack () comprises a first wafer (OW1) referred to as optics wafer and a second wafer (SW) referred to as spacer wafer, said optics wafer (OW1) having manufacturing irregularities. The spacer wafer (SW) is structured such that it at least partially compensates for said manufacturing irregularities. The corresponding method for manufacturing a device, which in particular can be an optical device, comprises carrying out a correction step for at least partially compensating for manufacturing irregularities. Such a correction step comprises providing a wafer (SW) referred to as spacer wafer, wherein that spacer wafer is structured for at least partially compensating for said manufacturing irregularities. Those manufacturing irregularities may comprise a deviation from a nominal value, e.g., a irregularities in focal length. The invention can allow to mass produce high-precision devices at a high yield.

Wafer-level fabrication of optical devices with front focal length correction

Identifying a location of a focal point of an optical system includes, in some implementations, using a sensor system to detect light that passed through the optical system, and determining a location of a focal point of the optical system based on a location of a focal point of the sensor system that substantially matches the location of the focal point of the optical system.

Measurement of focal points and other features in optical systems

Manufacturing optical devices (e.g., for cameras) includes providing and allocating mount elements to lens modules wherein the mount elements are to be arranged within the optical devices to define a fixed separation distance between the lens modules and the image sensor plane. The mount elements have variable mount FFL sections by means of which the geometrical distance between the lens module and the image sensor plane is adjusted for each lens module, individually or in groups dependent on the optical properties of the lens modules, to compensate the variation of the lens module values among the lens modules, so that the focal planes of the lens modules falls into the image sensor plane.

Growing community of inventors

Zug, Switzerland

Matthias Maluck