Growing community of inventors

Poughkeepsie, NY, United States of America

Matthias Lipinski

Average Co-Inventor Count = 3.06

ph-index = 4

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 79

Matthias LipinskiHaoren Zhuang (11 patents)Matthias LipinskiJingyu Lian (9 patents)Matthias LipinskiChandrasekhar Sarma (9 patents)Matthias LipinskiAlois Gutmann (5 patents)Matthias LipinskiRainer Leuschner (4 patents)Matthias LipinskiChong Kwang Chang (2 patents)Matthias LipinskiManfred Eller (1 patent)Matthias LipinskiHenning Haffner (1 patent)Matthias LipinskiJin-Ping Han (1 patent)Matthias LipinskiWolfgang Rogler (1 patent)Matthias LipinskiGeorg Wittmann (1 patent)Matthias LipinskiArvid Hunze (1 patent)Matthias LipinskiSajan Marokkey (1 patent)Matthias LipinskiO Sung Kwon (1 patent)Matthias LipinskiRoland Hampp (1 patent)Matthias LipinskiLen Yuan Tsou (1 patent)Matthias LipinskiShailendra Mishra (1 patent)Matthias LipinskiHelen Wang (1 patent)Matthias LipinskiManfred Waidhas (1 patent)Matthias LipinskiUlrich Gebhardt (1 patent)Matthias LipinskiGeorge Stojakovic (1 patent)Matthias LipinskiYoung Gun Ko (1 patent)Matthias LipinskiEgon Mergenthaler (1 patent)Matthias LipinskiTjin Tjin Tjoa (1 patent)Matthias LipinskiJochen Fricke (1 patent)Matthias LipinskiRaino Petricevic (1 patent)Matthias LipinskiMatthias Lipinski (19 patents)Haoren ZhuangHaoren Zhuang (36 patents)Jingyu LianJingyu Lian (28 patents)Chandrasekhar SarmaChandrasekhar Sarma (25 patents)Alois GutmannAlois Gutmann (38 patents)Rainer LeuschnerRainer Leuschner (74 patents)Chong Kwang ChangChong Kwang Chang (7 patents)Manfred EllerManfred Eller (49 patents)Henning HaffnerHenning Haffner (40 patents)Jin-Ping HanJin-Ping Han (39 patents)Wolfgang RoglerWolfgang Rogler (35 patents)Georg WittmannGeorg Wittmann (29 patents)Arvid HunzeArvid Hunze (20 patents)Sajan MarokkeySajan Marokkey (20 patents)O Sung KwonO Sung Kwon (16 patents)Roland HamppRoland Hampp (15 patents)Len Yuan TsouLen Yuan Tsou (13 patents)Shailendra MishraShailendra Mishra (13 patents)Helen WangHelen Wang (12 patents)Manfred WaidhasManfred Waidhas (9 patents)Ulrich GebhardtUlrich Gebhardt (7 patents)George StojakovicGeorge Stojakovic (6 patents)Young Gun KoYoung Gun Ko (5 patents)Egon MergenthalerEgon Mergenthaler (5 patents)Tjin Tjin TjoaTjin Tjin Tjoa (4 patents)Jochen FrickeJochen Fricke (4 patents)Raino PetricevicRaino Petricevic (3 patents)
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Inventor’s number of patents
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Strength of working relationships

Company Filing History:

1. Infineon Technologies Ag (14 from 14,705 patents)

2. Siemens Aktiengesellschaft (3 from 30,028 patents)

3. Samsung Electronics Co., Ltd. (2 from 131,214 patents)

4. International Business Machines Corporation (1 from 164,108 patents)

5. Osram Opto Semiconductors Gmbh (1 from 1,805 patents)

6. Chartered Semiconductor Manufacturing Ltd (corporation) (1 from 962 patents)

7. Infineon Technologies North America Corp. (1 from 244 patents)


19 patents:

1. 8697339 - Semiconductor device manufacturing methods

2. 8394574 - Metrology systems and methods for lithography processes

3. 8349528 - Semiconductor devices and methods of manufacturing thereof

4. 8071261 - Lithography masks and methods of manufacture thereof

5. 8067135 - Metrology systems and methods for lithography processes

6. 8063406 - Semiconductor device having a polysilicon layer with a non-constant doping profile

7. 8007985 - Semiconductor devices and methods of manufacturing thereof

8. 7892939 - Threshold voltage consistency and effective width in same-substrate device groups

9. 7842579 - Method for manufacturing a semiconductor device having doped and undoped polysilicon layers

10. 7794903 - Metrology systems and methods for lithography processes

11. 7674350 - Feature dimension control in a manufacturing process

12. 7541234 - Methods of fabricating integrated circuit transistors by simultaneously removing a photoresist layer and a carbon-containing layer on different active areas

13. 7223525 - Process for generating a hard mask for the patterning of a layer

14. 6933538 - Plasma encapsulation for electronic and microelectronic components such as organic light emitting diodes

15. 6835663 - Hardmask of amorphous carbon-hydrogen (a-C:H) layers with tunable etch resistivity

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