Asml Netherlands B.v.

Asml Holding N.v.

Matthias Kruizinga

Paul Janssen

Derk Servatius Gertruda Brouns

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Arnoud Willem Notenboom

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Frits Van Der Meulen

Robert Gabriël Maria Lansbergen

Jeroen Dekkers

Gerrit Van Den Bosch

Jérôme François Sylvain Virgile Van Loo

Maarten Mathijs Marinus Jansen

Ronald Harm Gunther Kramer

Jorge Manuel Azeredo Lima

Marc Bruijn

Marcus Adrianus Van De Kerkhof

James Norman Wiley

Dennis De Graaf

Robertus Cornelis Martinus De Kruif

Daniel Andrew Smith

Pieter-Jan Van Zwol

Mária Péter

David Ferdinand Vles

Maxim Aleksandrovich Nasalevich

Willem Joan Van Der Zande

Aleksandar Nikolov Zdravkov

Gijsbert Rispens

Erik Achilles Abegg

Angelo Cesar Peter De Klerk

Nadja Schuh

Michiel Alexander Blauw

Nirupam Banerjee

Silvester Matheus Reijnders

Antonius Willem Verburg

Maurice Leonardus Johannes Janssen

Nicolae Maxim

Anne Johannes Wilhelmus Van Lievenoogen

Frank Johannes Christiaan Theuerzeit

Geert Middel

Michel Loos

Roland Jacobus Johannes Kerstens

Jacobus Maria Dings

Claudia Piliego

Johannes Petrus Martinus Bernardus Vermeulen

Stephen Roux

Richard Joseph Bruls

Andrey Alexandrovich Nikipelov

Matthew Lipson

Joseph Harry Lyons

Egbert Lenderink

Willem-Pieter Voorthuijzen

Erik Willem Bogaart

Sandra Van Der Graaf

Mohammad Reza Kamali

Sander Van Den Heijkant

Martinus Jozef Maria Kester

Erik Henricus Egidius Catharina Eummelen

Nina Vladimirovna Dziomkina

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Takeshi Kaneko

Frank Auer

Fransiscus Mathijs Jacobs

Koos Van Berkel

Johannes Adrianus Cornelis Maria Pijnenburg

Peter Van Delft

Tammo Uitterdijk

Oleksiy Galaktionov

Ronnie Herman Anna Hensen

Roger Franciscus Mattheus Maria Hamelinck

Johannes Bernardus Charles Engelen

Kjeld Gertrudus Hendrikus Janssen

Marinus Augustinus Christiaan Verschuren

Kristof Custers

Amoud Willem Notenboom

Shahab Shervin

Martinus Jozef Maria Kesters

Ron Geeraard Catharina De Bruijn

Fransiscus Jacobs

Alexandar Nikolov Zdravkov

Mária PÉTER

Robertus Cornelis De Kruif

Beatrijs Louise Verbrugge

Derk Servatius Brouns

Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Membrane for EUV lithography

A pellicle frame includes: a first portion; and a plurality of second portions. The first portion is for connection to a border of a pellicle. The first portion includes a hollow and generally rectangular body. The plurality of second portions are for connection to a patterning device. The first portion and the plurality of second portions are all formed from a first material. Each of the second portions is connected to the first portion by a spring portion formed from the first material. Such a pellicle frame is advantageous since the first portion, the plurality of second portions and the spring portions are all formed from a same material.

Pellicle frame for EUV lithography

An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

Object holder, electrostatic sheet and method for making an electrostatic sheet

A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

Mask assembly and associated methods

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Mask assembly

Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Pellicle attachment apparatus

A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.

An immersion lithographic apparatus that includes a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and the substrate table, the substrate, or both. The swap table has a shutter surface configured to be under the fluid handling structure during, for example, swap of the substrate on the substrate table. In use, a transfer surface between a surface of the substrate table and a surface of the swap table is moved under the fluid handling structure to help stop escaping immersion liquid. A shutter member and a method are also disclosed.

Shutter member, a lithographic apparatus and device manufacturing method

Growing community of inventors

Herten, Netherlands

Matthias Kruizinga