Asml Netherlands B.v.

Matthias Kraushaar

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Dzmitry Labetski

Chunguang Xia

Andrew David LaForge

Christianus Wilhelmus Johannes Berendsen

Yue Ma

Henricus Gerardus Tegenbosch

Klaus Martin Hummler

Marc Guy Langlois

Kornelis Frits Feenstra

Kerim Nadir

Arun Johnkadaksham

Maksim Loginov

Seyedmohammad Mojab

Alexander Shatalov

John Tom Stewart

John Tom Stewart, Iv

Rui Miguel Duarte Rodrigues Nunes

Rui Miguel Duarte Rodreigues Nunes

Rui Miguel Duarte Rodriges Nunes

An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

Guiding device and associated system

Growing community of inventors

Eindhoven, Netherlands

Matthias Kraushaar