Lambda Physik Ag

Carl Zeiss Microimaging Gmbh

Matthias Kramer

Marcus Serwazi

Juergen Kleinschmidt

Peter Heist

Sergei V Govorkov

Uwe Stamm

Dirk Basting

Thomas Schroeder

Hans-Stephan Albrecht

Wolfgang Zschocke

Peter Schnuell

Andreas Nolte

Michael Brehm

Alexander Scheps

Christian Boeker

Hakon Mikkelsen

Konstantin Aab

Bruene Venus

Klaus Becker

Andreas Hermann

G&uuml;nter Nowinski

Thomas J&uuml;nemann

Thomas Schröeder

Kay Zimmermann

Stefan Niedermeier

The invention is directed to a multispectral illumination device for a microscope or for a reader. According to the invention, the illumination device comprises at least three receptacle positions for lighting modules and at least one receptacle position for coupling modules, the mechanical devices for connecting the lighting modules or coupling modules at the receptacle positions to the illumination device being designed in such a way that the lighting modules or coupling modules can be easily changed. Further, the receptacle positions are arranged in such a way that, with suitable selection of the lighting modules and coupling modules, all individual spectra of the lighting modules in a total spectrum are available simultaneously at the output of the illumination device.

Multispectral lighting apparatus

The invention is directed to a microscope in which laser light is used to irradiate a sample to be examined and which is outfitted with a protective device for preventing eye damage due to laser light. It is the object of the invention to provide a protective device for microscopes of the type described above which ensures protection against eye damage and visibility of the sample. According to the invention, the protective device has at least one area which is not transparent to harmful radiation components, but which is transparent to harmless, visible radiation components, so that an observer can see the sample through this area without risk of eye damage.

Microscope with laser light source and protective device for preventing eye damage

A line-narrowing module for a laser includes a prism beam expander and a grating preferably attached to a heat sink. A pressure-controlled enclosure filled with an inert gas seals the grating and/or other elements of the line-narrowing module. The pressure in the enclosure is adjusted for tuning the wavelength. Preferably, the pressure is controlled by controlling the flow of an inert gas through the enclosure. A pump may be used, or an overpressure flow may be used. Alternatively, a prism of the beam expander or an etalon may be rotatable for tuning the wavelength.

Tunable laser with stabilized grating

An apparatus for adjusting an orientation of an optical component mounted within a laser resonator with suppressed hysteresis includes an electromechanical device, a drive element, and a mechano-optical device coupled to the mounted optical component. The drive element is configured to contact and apply a force to the mechano-optical device in such a way as to adjust the orientation of the mechano-optical device, and thereby that of the optical component, to a known orientation within the laser resonator. The optical component is mounted such that stresses applied by the mount to the optical component are homogeneous and substantially thermally-independent.

Line-narrowing optics module having improved mechanical performance

A wavelength chirp compensation method for an excimer or molecular fluorine laser system operating in burst mode, includes pre-programming into a computer of the laser system resonator tuning optic adjustments for making the adjustments during pauses between bursts to compensate wavelength chirp at beginnings of succeeding bursts.

Chirp compensation method and apparatus

An E-Diagnostic system for monitoring a state of an excimer laser or molecular fluorine laser system includes a processing device and an interface. The processing device runs a program for outputting parameter requests to the laser system, receiving parameter values from the laser system in response to the parameter requests, and storing the parameter values such that a record of the state of the excimer or molecular fluorine laser system is kept. The interface signal-couples the processing device with the laser system permitting the outputting of the parameter requests and the receiving of the parameter values between the processing device and the laser system.

E-diagnostic, laser simulator, automated testing and deconvolution of spectra for lithographic exposure radiation generating systems such as excimer or molecular fluorine laser or EUV source systems

A first method for determining the relative wavelength shift of a laser beam away from a known reference line, such as an absorption line of a gas in an opto-galvanic cell or a reference line of reference laser uses a monitor etalon. The FSR of the etalon used to calculate the wavelength shift is determined based on a calculated gap spacing between the etalon plates, or etalon constant. The gap spacing is determined based on a fit to measured values of wavelength deviations of the FSR as a function of the relative wavelength shift. The FSR used to calculate the wavelength shift is also based on the wavelength shift itself. A second method for measuring the absolute bandwidth and spectral purity of a tunable laser beam uses an opto-galvanic or absorption cell. The laser beam is directed to interact with a gas in the cell that undergoes an optical transition within the spectral tuning range of the laser. The beam is tuned through the optical transition line of the gas in the cell, and the opto-galvanic or absorption spectrum of the line is measured. The measured bandwidth and spectral purity are convoluted or broadened by the bandwidth of the laser beam used in the measurement. The bandwidth and spectral purity of the laser beam are determined based on the bandwidth and spectral purity, respectively, of the measured spectrum and a known correspondence between the measured convoluted bandwidth and spectral purity and the bandwidth and spectral purity, respectively, of the laser beam.

Laser wavelength and bandwidth monitor

An excimer or molecular fluorine laser system includes a discharge chamber containing a gas mixture, multiple electrodes connected to a power supply circuit for energizing the gas mixture, a resonator for generating a laser beam, a processor, and means for monitoring an amplified spontaneous emission (ASE) signal of the laser, such as preferably an ASE detector. The processor receives a signal from the preferred ASE detector indicative of the ASE signal of the laser. Based on the signal from the ASE detector, the processor determines whether to initiate a responsive action for adjusting a parameter of the laser system.

Gas performance control system for gas discharge lasers

A technique for testing the quality of optical components of a line-narrowing module is performed on-line. As the wavelength tends to drift from a desired value when the optical components of the line-narrowing module are heated due to absorption, one or more optical components is adjusted such as by rotation to tune the wavelength back to the desired wavelength using a feedback loop. The amount of adjustment of these optical components is monitored for indirectly measuring, and thereby testing, the absorption or quality of the optical components.

Resonator optics monitoring method

A line narrowing unit for use within an excimer or molecular fluorine laser resonator includes a dispersive prism having antireflection coatings on entrance and exit surfaces. Entrance and exit angles and an apex angle are increased to enhance the dispersive power of the prism, while the antireflective coatings limit reflective losses. Preferably, a laser beam makes a non-symmetric pass through said prism. The apex angle is preferably greater than 65&deg;, or even 75&deg;, and the angle of incidence and the exit angle of the beam are each preferably greater than 65&deg;. A beam expanding prism configured for enhanced beam expansion has an apex angle between within a range of 37.5&deg; and 42.5&deg;, and a beam incidence angle at the entrance surface of more than 65&deg;, and an antireflection coating on preferably both the entrance and exit surfaces.

Growing community of inventors

Goettingen, Germany

Matthias Kramer