Carl Zeiss Smt Gmbh

Matthias Kaes

Matthias Manger

Walter Pauls

Christoph Petri

Steffen Bezold

Pavel Alexeev

A method for producing a reflecting optical element for a projection exposure apparatus (). The element has a substrate () with a substrate surface (), a protection layer () and a layer partial system () suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (), (b) irradiating the substrate () with electrons (), and (c) tempering the substrate (). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror () as reflective optical element, and a projection exposure apparatus () including such a projection lens.

Method for producing a reflecting optical element of a projection exposure apparatus and reflecting optical element for a projection exposure apparatus, projection lens and projection exposure apparatus

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Aalen, Germany

Matthias Kaes