Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh

Matthias Firnkes

Stefan Lanio

John Breuer

Florian Lampersberger

Dieter Winkler

Jürgen Frosien

Benjamin John Cook

Dominik Patrick Ehberger

Carlo Salvesen

Gerald Schönecker

Shem Yehoyda Prazot Ofenburg

Hanno Kaupp

Johannes Hopster

Thomas Kernen

A method of determining a brightness (B) of a charged particle beam () focused by a focusing lens () toward a sample () in a charged particle beam imaging device () is described. The method includes (a) taking one or more images (h) of the sample with the charged particle beam imaging device; (b) retrieving one or more beam profiles (g) of the charged particle beam from the one or more images; and (c) determining the brightness (B) of the charged particle beam () based on at least the one or more beam profiles (g, g), a probe current (I) of the charged particle beam, and a landing potential (LE) of the charged particle beam. Optionally, the brightness (B) determined as above can be used for determining a size (D) of a source () of the charged particle beam (). Further, a charged particle beam imaging device () configured for any of the methods described herein is provided.

Method of determining a brightness of a charged particle beam, method of determining a size of a source of the charged particle beam, and charged particle beam imaging device

A method of determining aberrations of a charged particle beam () focused by a focusing lens () toward a sample () in a charged particle beam system is described. The method includes: (a) taking one or more images of the sample at one or more defocus settings to provide one or more taken images (h...); (b) simulating one or more images of the sample taken at the one or more defocus settings based on a set of beam aberration coefficients (C) and a focus image of the sample to provide one or more simulated images; (c) comparing the one or more taken images and the one or more simulated images for determining a magnitude (Ri) of a difference therebetween; and (d) varying the set of beam aberration coefficients (C) to provide an updated set of beam aberration coefficients (C) and repeating (b) and (c) using the updated set of beam aberration coefficients (C) in an iterative process for minimizing said magnitude (R). Alternatively, in (b), one or more beam cross sections may be simulated, and, in (c) the simulated beam cross sections may be compared with one or more retrieved beam cross sections retrieved from the one or more taken images for determining a magnitude (R) of a difference therebetween. Further, a charged particle beam system for imaging and/or inspecting a sample that is configured for any of such methods is provided.

Methods of determining aberrations of a charged particle beam, and charged particle beam system

A method of determining a beam convergence of a charged particle beam () focused by a focusing lens () toward a sample () in a charged particle beam system () is provided. The method includes (a) taking one or more images of the sample when the sample is arranged at one or more defocus distances from a respective beam focus of the charged particle beam; (b) retrieving one or more beam cross sections from the one or more images; (c) determining one or more beam widths from the one or more beam cross sections; and (d) calculating at least one beam convergence value based on the one or more beam widths and the one or more defocus distances. Further, a charged particle beam system for imaging and/or inspecting a sample that is configured for any of the methods described herein is provided.

Method of determining the beam convergence of a focused charged particle beam, and charged particle beam system

Provided is an aberration corrector having a plurality of magnetic poles including a first magnetic pole and further magnetic poles, a ring that magnetically connects the plurality of magnetic poles with one another, the ring having a constant spacing to at least the first magnetic pole, a plurality of magnetic field modulators including a first magnetic field modulator and further magnetic field modulators, and a plurality of guides including a first guide and further guides; wherein the first magnetic field modulator includes a soft magnetic material, wherein the first magnetic field modulator is disposed in a first position, the first position being one of the following: adjacent to a first air gap separating the first magnetic pole and the ring, or at an inner ring surface or radially outward of the inner ring surface along an axis of the first magnetic pole, and wherein the first guide constrains the first magnetic field modulator to positions along a first axis substantially parallel to or coincident with the axis of the first magnetic pole.

Aberration corrector and method of aligning aberration corrector

An electrode arrangement for acting on a charged particle beam in a charged particle beam apparatus is described. The electrode arrangement includes a first electrode with a first opening for the charged particle beam; a first spacer element positioned in a first recess provided in the first electrode on a first electrode side for aligning the first electrode relative to a second electrode, the first spacer element having a first blind hole; a first conductive shield provided in the first blind hole; and a contact assembly protruding from the first electrode into the first blind hole for ensuring an electrical contact between the first electrode and the first conductive shield. Further, a contact assembly for such an electrode arrangement, a charged particle beam device with such an electrode arrangement, as well as a method of reducing an electrical field strength in an electrode arrangement are described.

Electrode arrangement, contact assembly for an electrode arrangement, charged particle beam device, and method of reducing an electrical field strength in an electrode arrangement

A secondary charged particle imaging system comprising: a backscattered electron detector module, wherein the backscattered electron detector module is rotatable between a first angular position and a second angular position about an axis.

Secondary charged particle imaging system

A charged particle beam device for inspecting a specimen is described. The charged particle beam device includes a beam source for emitting a charged particle beam, an electrode for influencing the charged particle beam, and a damping unit provided on the electrode for damping vibrations of the electrode. Further, an objective lens module with an electrode is described, wherein a damping unit is provided on the electrode. Further, an electrode device is described, wherein a mass damper is mounted on a disk-shaped electrode body of the electrode device.

Charged particle beam device, objective lens module, electrode device, and method of inspecting a specimen

A method of imaging a secondary charged particle beam emanating from a sample by impingement of a primary charged particle beam is provided. The method includes setting a first operating parameter to a first value. The first operating parameter is selected from a group including: landing energy of the primary charged particle beam on the sample, extraction field strength for the secondary charged particle beam at the sample, magnetic field strength of an objective lens that focuses the primary charged particle beam onto the sample, and working distance of the objective lens from the sample. The method further includes controlling, while the first operating parameter is set to the first value, the excitation of a first lens and of a second lens to map the secondary charged particle beam onto a first region on an aperture plate. The first region overlaps with a first opening of the aperture plate and with a second opening of the aperture plate. The method further includes setting the first operating parameter to a second value different from the first value. The method further includes controlling, while the first operating parameter is set to the second value, the excitation of the first lens and of the second lens to map the secondary charged particle beam onto the first region on the aperture plate.

System and method for imaging a secondary charged particle beam with adaptive secondary charged particle optics

A secondary charged particle imaging system for imaging a secondary charged particle beam emanating from a sample by impingement of a primary charged particle beam is provided. The system includes a detector arrangement, and an adaptive secondary charged particle optics. The detector arrangement comprises a first detection element for detecting a first secondary charged particle sub-beam of the secondary charged particle beam, and a second detection element for detecting a second secondary charged particle sub-beam of the secondary charged particle beam. The adaptive secondary charged particle optics comprises an aperture plate including a first opening for letting the first secondary charged particle sub-beam pass through and a second opening for letting the second secondary charged particle sub-beam pass through; a lens system for mapping the secondary charged particle beam onto the aperture plate, the lens system comprising a first lens and a second lens; and a controller for controlling the excitation of the first lens and the excitation of the second lens. The controller is configured to independently control the excitation of the first lens and of the second lens to map the secondary charged particle beam onto the aperture plate so that the first secondary charged particle sub-beam passes through the first opening and the second secondary charged particle sub-beam passes through the second opening independent of a variation of at least one first operating parameter selected from a group comprising: landing energy of the primary charged particle beam on the sample, extraction field strength for the secondary charged particle beam at the sample, magnetic field strength of an objective lens that focuses the primary charged particle beam onto the sample, and working distance of the objective lens from the sample.

System for imaging a secondary charged particle beam with adaptive secondary charged particle optics

A signal charged particle deflection device for a charged particle beam device is provided. The signal charged particle deflection device includes a beam bender configured for deflecting the signal charged particle beam, wherein the beam bender includes a first electrode and a second electrode providing an optical path for the signal charged particle beam therebetween, wherein the first electrode has a first cross section in a plane perpendicular to the optical path, and the second electrode has a second cross section in the plane perpendicular to the optical path, and wherein a first part of the first cross section and a second part of the second cross section provide the optical path therebetween, and wherein the first part and the second part are different in shape.

Signal charged particle deflection device, signal charged particle detection system, charged particle beam device and method of detection of a signal charged particle beam

The present disclosure provides a charged particle beam device. The charged particle beam device includes an emitter arrangement configured to generate a primary charged particle beam having two or more primary charged particle sub-beams, a sample stage for supporting a sample, an objective lens for focusing the two or more primary charged particle sub-beams onto the sample, and a primary charged particle optics. The primary charged particle optics includes a coil provided between the emitter arrangement and the objective lens. The coil is configured to generate a magnetic field having a magnetic field component parallel to a longitudinal axis of the coil, wherein the magnetic field acts on the two or more primary charged particle sub-beams propagating along the longitudinal axis, and wherein an aspect ratio of the coil is at least 1. A controller is configured to adjust the magnetic field of the coil such that a first primary charged particle sub-beam of the two or more primary charged particle sub-beams is directed towards a first spot on the sample and a second primary charged particle sub-beam of the two or more primary charged particle sub-beams is directed towards a second spot on the sample, wherein the first spot and the second spot are spaced apart from each other.

Charged particle beam device, system for a charged particle beam device, and method for operating a charged particle beam device

The present disclosure provides a system for imaging a signal charged particle beam emanating from a sample by impingement of a primary charged particle beam. The system includes a detector arrangement having a first detection element for detecting a first signal charged particle sub-beam of the signal charged particle beam originating from a first spot on the sample and a second detection element for detecting a second signal charged particle sub-beam of the signal charged particle beam originating from a second spot on the sample, wherein the first detection element and the second detection element are separated from each other, and signal charged particle optics. The signal charged particle optics includes a coil configured to generate a magnetic field having a magnetic field component parallel to a longitudinal axis of the coil, wherein the magnetic field acts on the first signal charged particle sub-beam and the second signal charged particle sub-beam propagating along the longitudinal axis, and wherein an aspect ratio of the coil is at least 1, and a controller configured to adjust the magnetic field of the coil such that the first signal charged particle sub-beam is directed towards the first detection element and the second signal charged particle sub-beam is directed towards the second detection element.

System for imaging a signal charged particle beam, method for imaging a signal charged particle beam, and charged particle beam device

A beam separator device () is described. The beam separator device () includes a first deflector () providing a first magnetic deflection field (B) for deflecting a charged particle beam () propagating along a beam entrance axis (A) by a first deflection angle (&#x3b1;); a second deflector () arranged downstream from the first deflector () providing a second magnetic deflection field (B) for deflecting the charged particle beam by a second deflection angle (&#x3b1;) in the direction of an intermediate beam axis (A), wherein the second deflector () is configured for deflecting the charged particle beam () re-entering the beam separator device () along the intermediate beam axis (A) by a third deflection angle (&#x3b1;); a third deflector () arranged downstream from the second deflector () providing a third magnetic deflection field (B) for deflecting the charged particle beam () by a fourth deflection angle (&#x3b1;) in the direction of a beam exit axis (A); a first rotation-free lens to be arranged at a first crossover (X) of the charged particle beam between the first deflector () and the second deflector () for at least partially compensating for a dispersion introduced by at least one of the first deflector and the second deflector; and a second rotation-free lens to be arranged at a second crossover (X) of the charged particle beam between the second deflector () and the third deflector () for at least partially compensating for a dispersion introduced by at least one of the second deflector and the third deflector.

Beam separator device, charged particle beam device and methods of operating thereof

A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection areas, wherein the active detection areas are separated by a gap (G), a particle optics configured for separating the signal beam into a first portion of the signal beam and into at least one second portion of the signal beam, and configured for focusing the first portion of the signal beam and the at least one second portion of the signal beam. The particle optics includes an aperture plate and at least a first inner aperture openings in the aperture plate, and at least one second radially outer aperture opening in the aperture plate, wherein the first aperture opening has a concave shaped portion, particularly wherein the first aperture opening has a pincushion shape.

Growing community of inventors

Walpertskirchen, Germany

Matthias Firnkes