Karlsruher Institut Fur Technologie

Nanoscribe Holding Gmbh

Matthias Blaicher

Christian Koos

Philipp-Immanuel Dietrich

Nicole Lindenmann

Yilin Xu

Maria Laura Gödecke

Philipp Dietrich

Tobias Hoose

Ingo Reuter

Martin Wegener

Wolfram Pernice

Hendrik Hölscher

Gerald Goering

Mareike Trappen

Aleksandar Nesic

Jörg Hoffmann

Maria Laura Godecke

The present invention relates to a micro-optomechanical system () and to a method for the production thereof. The micro-optomechanical system () comprises The micro-optomechanical systems () provided have virtually any desired shaping in conjunction with very high resolution and are therefore suitable for a wide range of applications.

Micro-optomechanical system and method for the production thereof

The invention relates to a method and to an assembly () for localizing an optical coupling point () and to a method for producing a microstructure () at the optical coupling point (). The method for localizing an optical coupling point () comprises the following steps: a) providing an optical component (), which comprises an optical coupling point (), the optical coupling point having an interaction region () lying outside of a volume encompassed by the optical component (); b) producing optical radiation in a production region (), the production region () overlapping at least partly with the interaction region () of the optical coupling point (), light being applied to a medium () located in the production region (), which light is modified by the medium () in such a way that the optical radiation is thereby produced; c) sensing at least part of the produced optical radiation in a sensing region (), the sensing region () overlapping at least partly with the interaction region () of the optical coupling point (), and determining a spatially resolved distribution of the sensed part of the produced optical radiation; and d) determining the localization of the optical coupling point () from the determined spatially resolved distribution of the sensed part of the produced optical radiation, the optical radiation being produced or at least the part of the produced optical radiation being sensed through the optical coupling point (). The optical coupling point () can thereby be precisely localized with a relative positioning tolerance of better than 1 μm. Thus, low coupling losses of an optical connection to the optical component () can be achieved and microstructures () can be precisely placed at the optical coupling point ().

Localization of optical coupling points

An optical system and a method for producing it is disclosed. The optical system has at least two separate optical components and an optical connection between them. In the inventive method, first and second optical component are provided, each having respective beam profiles. An arrangement of the first and second optical components and the form and target position of at least one beam-shaping element are specified. The beam-shaping element is produced using a three-dimensional direct-writing lithography method in situ at the target position to thereby obtain an optical component supplemented by the beam-shaping element. The supplemented optical component is placed and fixed on common base plate to thereby obtain the optical system. The optical systems produced with the present method can be used in optical data transfer, measurement technology and sensors, life sciences and medical technology, or optical signal processing.

Method for producing an optical system and optical system

Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.

Method and device for lithographically producing a target structure on a non-planar initial structure

The present invention is related to an integrated optical circuit, in particular, to an optical-field writable array, as well as to methods for its manufacturing and reconfiguring. The integrated optical circuit comprises at least one nanophotonic device and at least one photonic wire, wherein the nanophotonic device comprises a substrate equipped with at least one reception for at least one external connector, wherein the reception is coupled to at least one connector waveguide, and at least one set of nano-optic components, wherein the nano-optic component is one of a nanophotonic waveguide or a nanophotonic component, wherein the nano-photonic component is nano-optically coupled to at least one nanophotonic waveguide, wherein at least one of the nanophotonic waveguides is selectively coupleable to at least one of the connector waveguides, wherein the photonic wire connects at least one of the nanophotonic waveguides to at least one of the connector waveguides.

Integrated optical circuit and methods for its manufacturing and reconfiguring

Growing community of inventors

Ettlingen, Germany

Matthias Blaicher