North Carolina State University

Imagineoptix Corporation

Matthew N Miskiewicz

Michael James Escuti

Jihwan Kim

A direct-write lithography apparatus includes a polarization selector stage configured to vary a polarization orientation angle of light from a light source, a focusing element configured to focus the light from the light source into a spot at a focal plane thereof, and a scanning stage configured to scan the spot in at least two dimensions along a surface of a polarization-sensitive recording medium that is arranged proximate to the focal plane such that neighboring scans substantially overlap. The polarization selector stage and the scanning stage are configured to be operated independently of one another. Related fabrication methods of and optical elements fabricated thereby are also discussed.

Growing community of inventors

Raleigh, NC, United States of America

Matthew N Miskiewicz