Dow Global Technolgoies LLC

Rohm & Haas Electronic Materials LLC

Matthew M Meyer

Jong Keun Park

Young Cheol Bae

Owendi Ongayi

Matthew D Christianson

Seung-Hyun Lee

Jibin Sun

A copolymer comprises the polymerized product of a dissolution-rate controlling monomer having the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III): wherein R, R, R, L, X, and Zare defined herein. A photoresist composition comprising the copolymer is described, as is an article coated with the photoresist composition, and a method of forming an electronic device using the photoresist composition.

Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist

Polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Polymers, photoresist compositions and methods of forming photolithographic patterns

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Midland, MI, United States of America

Matthew M Meyer