Asml Holding N.v.

Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Asml Holdings N.v.

Matthew Lipson

Johannes Catharinus Hubertus Mulkens

Marcel Mathijs Theodore Marie Dierichs

Erik Roelof Loopstra

Tammo Uitterdijk

Ronald A Wilklow

Johannes Jacobus Matheus Baselmans

Hendricus Johannes Maria Meijer

Richard Joseph Bruls

Louis John Markoya

Uwe Mickan

Johannes Christiaan Maria Jasper

Sjoerd Nicolaas Lambertus Donders

Bob Streefkerk

Christopher John Mason

Roel De Jonge

Martinus Hendrikus Antonius Leenders

Raymond Wilhelmus Louis Lafarre

Johannes Petrus Martinus Bernardus Vermeulen

Harry Sewell

Frits Van Der Meulen

Stephen Roux

Paul Janssen

Antonius Franciscus Johannes De Groot

Joseph Harry Lyons

Derk Servatius Gertruda Brouns

Robert Gabriël Maria Lansbergen

Matthias Kruizinga

Ronald Van Der Wilk

Jeroen Dekkers

Erik Willem Bogaart

Robert D Harned

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Gerrit Van Den Bosch

Mehmet Ali Akbas

Jérôme François Sylvain Virgile Van Loo

Sandra Van Der Graaf

Maarten Mathijs Marinus Jansen

Ronald Harm Gunther Kramer

Mohammad Reza Kamali

Jorge Manuel Azeredo Lima

Marc Bruijn

Geoffrey O'Connor

Iliya Sigal

Timothy O'Neil

Sander Van Den Heijkant

Kenneth C Henderson

Damoon Sohrabibabaheidary

Taras Shvets

Justin Lloyd Kreuzer

Azat M Latypov

Santiago E Del Puerto

Michael Perry

Christoph Zaczek

Eric Eva

Jimmy Matheus Wilhelmus Van De Winkel

Bert Dirk Scholten

David Hart Peterson

Satish Achanta

Kennard White

Erik Loopstra

Santiago E Delpuerto

Peter Richard Helmus

James Kennon

David Heald

Tammo Utterdijk

Peter Helmus

Benjamin David Dawson

Matthew Anthony Sorna

Jerry Jianguo Deng

Drew Chieda

Victor Perez-falcon

Moshe Shemesh

Vincent Dimilia

Ronald Peter Totillo

Steven Michael Zimmerman

Wilbur Jordan Reichmann, Ii

Johannes Baselmans

Marcel Dierichs

Johannes Mulkenss

Johannes Jasper

Hendricus Meijer

Johannes Christian Maria Jasper

Hendricus Johanne Maria Meijer

Systems, apparatuses, and methods are provided for manufacturing an electrostatic clamp. An example method can include forming, during a first duration of time comprising a first time, a top clamp comprising a first set of electrodes and a plurality of burls. The method can further include forming, during a second duration of time comprising a second time that overlaps the first time, a core comprising a plurality of fluid channels configured to carry a thermally conditioned fluid. The method can further include forming, during a third duration of time comprising a third time that overlaps the first time and the second time, a bottom clamp comprising a second set of electrodes. In some aspects, the example method can include manufacturing the electrostatic clamp without an anodic bond.

Systems and methods for manufacturing a double-sided electrostatic clamp

This disclosure relates to a method for producing a mirror of a microlithographic projection exposure apparatus, a first mirror part and a second mirror part being provided, which are in contact in the region of a first connecting surface of the first mirror part and a second connecting surface of the second mirror part. For forming a durable connection between the first mirror part and the second mirror part, the first mirror part and the second mirror part are heated up to a holding temperature of at least 400° C. and are kept at the holding temperature during a holding time. After the holding time has elapsed, the first mirror part and the second mirror part are cooled down to a first cooling temperature at a first cooling rate of less than or equal to 100 K/h.

Method for producing a mirror of a microlithographic projection exposure apparatus

A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.

Method to manufacture nano ridges in hard ceramic coatings

A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

Lithographic apparatus, substrate table, and method

Methods and systems are described for reducing adhesion and controlling friction between a wafer and a wafer table during semiconductor photolithography wherein the tops of burls on the wafer table have a layer with a nanoscale topography.

Lithography supports with defined burltop topography

A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.

Substrates and methods of using those substrates

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Mask assembly

A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

Lithographic apparatus and method

An electrostatic clamp () and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer () having a first ultra-low expansion (ULE) material, a second layer () coupled to the first layer, having a second ULE material, and a third layer (), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels () located between the first layer and the second layer and a composite layer () interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.

Electrostatic clamp and a method for manufacturing the same

A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaFis also disclosed.

Lithographic apparatus and device manufacturing method

A support such as a clamp () is configured to releasably hold a patterning device such as a reticle () to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate () having opposing first () and second () surfaces, a plurality of burls () located on the first surface and configured to contact the reticle, a second substrate () having opposing first () and second () surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements () are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaFis also disclosed.

An electrostatic clamp for use in a lithographic apparatus includes burls and an electrode surrounded by an insulator and/or a dielectric material between adjacent burls. In an embodiment, two or more layers of dielectric material are provided between adjacent burls and surround an electrode provided between adjacent burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.

Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp

Growing community of inventors

Stamford, CT, United States of America

Matthew Lipson