Asml Holding N.v.

Asml Holdings N.v.

Matthew E Hansen

Ronald A Wilklow

Systems and methods are provided for utilizing an image-compensating addressable electrostatic chuck to correct for imaging errors of a lithographic system. An image-compensating addressable electrostatic chuck comprises a substrate, a plurality of first electrodes, a plurality of second electrodes, and a support layer. The plurality of first electrodes are disposed on the substrate and spaced evenly in a first direction. The plurality of second electrodes are disposed on the substrate and spaced evenly in a second direction, the second direction being generally orthogonal to the first direction. The support layer is disposed above the pluralities of electrodes to support an object. Positionally overlapping portions of the plurality of first and second electrodes form a matrix of electrostatic force points, such that a non-uniform electrostatic force acts on the object in proximity of a given force point upon energizing a pair of the plurality of first and second electrodes associated with the given force point.

Image-compensating addressable electrostatic chuck system

The divergence of an optical beam is determined. An optic is configured to provide internal reflection of at least a part of a beam of radiation scanned over varying angles of incidence on the optic. The optic has a film configured to provide a surface plasmon resonance (SPR) effect. A detector is arranged relative to the optic and configured to electronically detect radiation reflected from the optic. The divergence angle of the beam of radiation is calculated based on a change in reflectance relative to angle of incidence.

Beam characterization monitor for sensing pointing or angle of an optical beam

Characterization of an optical system is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space. A reticle and image plane are positioned obliquely with respect to each other such that a reticle having a plurality of feature sets thereon, including periodic patterns or gratings, is imaged in a volume of space, including the depth of focus. Metrology tools are used to analyze the detected or recorded image in the volume of space through the depth of focus in a single step or exposure to determine the imaging characteristics of an optical system. Focus, field curvature, astigmatism, spherical, coma, and/or focal plane deviations can be determined. The present invention is particularly applicable to semiconductor manufacturing and photolithographic techniques used therein, and is able to quickly characterize an optical system in a single exposure with dramatically increased data quality and continuous coverage of the full parameter space. In embodiments, the test reticle is holographically generated by interfering two or more beams of optical radiation. The resulting interference pattern is recorded on a reticle and used for testing the optical system. The geometry of the holographic interference pattern is tightly controlled by the properties of the interfering beams and is therefore more accurate than conventional reticle writing techniques.

Methods for making holographic reticles for characterizing optical systems

This invention relates to an apparatus for optical beam shaping and diffusing, a method for making the apparatus, and a method for using the apparatus. The apparatus comprises a crystalline material object shaped to fit within an optical train and with a pattern of surface texture along an optical path. Surface removal processes are applied to a portion of a surface of an object made of a crystalline material to form a surface texture pattern at that portion of the surface of the object. The surface texture pattern depends upon: (1) the identity of the crystalline material and (2) the orientation of crystal lattice axes within the object with respect to the portion of the surface of the object where the pattern of surface texture is to be formed. Processes for making the apparatus include, but are not limited to, mechanical grinding, ablating, chemical etching, plasma etching, ion milling, and combinations thereof. The arrangement of the pattern of surface texture can be refined by coupling lithographic patterning methods with any of the surface removal processes. The apparatus can be used to change one or more of: (1) a shape, (2) an orientation, (3) an aspect ratio, (4) an angular pupil distribution, and (5) an intensity profile of a cross section of an optical beam.

Apparatus for optical beam shaping and associated methods

Method for characterizing optical systems using holographic reticles

Methods for optical beam shaping and diffusing

The present invention is directed at a coherence test reticle or lithographic plate, and a method for testing the coherence of a laser beam using the test reticle. The quality or coherence of the laser beam is measured by illuminating the test reticle and recording and/or analyzing the optical patterns generated by the illumination. The technique was designed for the characterization of laser-based systems via the detection of optical radiation modulated by transmissive, reflective and diffractive patterns printed on a reticle or lithographic plate designed specifically for this purpose. The novelty and advantages over the prior art are insensitivity to vibration, alignment, and multi-path differences associated with classical interferometric coherence measurement techniques. The technique is focus error insensitive. The robustness and convenience of the technique is driven by the use of a single plate with no optical alignment, making the technique easily implemented in the field.

Apparatus for optical system coherence testing

Apparatus for optical beam shaping and diffusing and associated methods

Characterization of an optical system is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space. A reticle and image plane are positioned obliquely with respect to each other such that a reticle having a plurality of feature sets thereon, including periodic patterns or gratings, is imaged in a volume of space, including the depth of focus. Metrology tools are used to analyze the detected or recorded image in the volume of space through the depth of focus in a single step or exposure to determine the imaging characteristics of an optical system. Focus, field curvature, astigmatism, spherical, coma, and/or focal plane deviations may be determined. The present invention is particularly applicable to semiconductor manufacturing and photolithographic techniques used therein, and is able to quickly characterize an optical system in a single exposure with dramatically increased data quality and continuous coverage of the full parameter space.

Method and apparatus for characterization of optical systems

The present invention is directed at a coherence test reticle or lithographic plate, and a method for testing the coherence of a laser beam using the test reticle. The quality or coherence of the laser beam is measured by illuminating the test reticle and the recording and/or analyzing the optical patterns generated by the illumination. The technique was designed for, but not limited to, the characterization of laser-based systems via the detection of optical radiation modulated by transmissive, reflective and diffractive patterns printed on a reticle or lithographic plate designed specifically for this purpose. The novelty and advantages over the prior art are insensitivity to vibration, alignment, and multi-path differences of classical interferometric coherence measurement techniques. Spatial coherence and longitudinal or temporal coherence may be measured independently. Vertical and horizontal coherence may be measured independently. The technique is focus error insensitive. That is to say, that focus errors will be recorded by the technique in a deterministic fashion and can be removed from the data. The robustness and convenience of the technique is driven by the single plate with no optical alignment, making the technique easily implemented in the field. The multiplexing of the feature orientations, sizes and line types and feature locations allows for the determination of coherence parameters as a function of position in the beam.

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Ridgefield, CT, United States of America

Matthew E Hansen