Asml Netherlands B.v.

Mattheus Johannes Van Bruggen

Johannes Jacobus Matheus Baselmans

Heine Melle Mulder

Willem Richard Pongers

Gerardus Johannes Joseph Keijsers

Francis Fahrni

Joost Cyrillus Lambert Hageman

David James Butler

Patrick Marcel Maria Thomassen

Gabriela Vesselinova Paeva

Johannes Franciscus Roosekrans

A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.

Lithographic apparatus and method

Growing community of inventors

Rijswijk, Netherlands

Mattheus Johannes Van Bruggen