Leland Stanford Junior University

The Francis Crick Institute Limited

Matt R Angle

Nicholas A Melosh

Mina-Elraheb Saad Hanna

Yifan Kong

Andreas Schaefer

Jun Ding

Methods for patterning highly sensitive materials, such as organic materials, organic semiconductors, biomolecular materials, and the like, with photolithographic resolution are disclosed. In some embodiments, a germanium mask () is formed on the surface of the sensitive material (), thereby protecting it from subsequent processes that employ harsh chemicals that would otherwise destroy the sensitive material (). A microlithography mask () is patterned on the germanium mask layer (), after which the germanium exposed by the microlithography mask () is removed by dissolving it in water. After transferring the pattern of the germanium mask () into the sensitive material (), the germanium and microlithography masks () are completely removed by immersing the substrate in water, which dissolves the remaining germanium and lifts off the microlithography mask material. As a result, the only chemical to which the sensitive material () is exposed during the patterning process is water, thereby mitigating or avoiding damage to the material ().

Method for lithograghic patterning of sensitive materials

A probe suitable for deep-brain recording and stimulation is provided. The probe comprises a wire bundle that includes a plurality of wires, an integrated circuit having a plurality of electrodes, and an interposer that joins the wire bundle and the integrated circuit such that each of the plurality of electrodes is electrically connected with a different wire of the plurality of wires.

Deep-brain probe and method for recording and stimulating brain activity

Growing community of inventors

Stanford, CA, United States of America

Matt R Angle