Nanostellar, Inc.

Applied Materials, Inc.

Beijing Apollo Ding Rong Solar Technology Co., Ltd.

Mats Larsson

Juan Cai

Kevin A Papke

Cetin Kilic

Kartik Bhupendra Shah

Umesh M Kelkar

Xianghong Hao

Jifei Jia

Karthikeyan Balaraman

Rajasekhar Patibandla

Balamurugan Ramasamy

John Frederick Corson

Ron Rulkens

Neil Mackie

Robert D Tas

Weijie Zhang

Jonathan W Woo

Alex Austin

Jochen Titus

Robert Zubeck

Korhan Demirkan

Ariana Zimbouski

Jangsuk Hyun

Swati Sevanna

Ligen Wang

Randy Dorn

Asit Rairkar

Ajay Saproo

Dan Vitkavage

Sathyanarayana Bindiganavale

Kyle L Fujdala

Simon Yavelberg

Yongqi Hu

Jianqi Wang

Yogita Pareek

Jian Wang

William M Lu

Tasnuva Tabassum

Chirag Shaileshbhai Khairnar

Patrick Ala

Bo B Ding

Embodiments of the present disclosure are directed towards a protective multilayer coating for process chamber components exposed to temperatures from about 20&#xb0; C. to about 300&#xb0; C. during use of the process chamber. The protective multilayer coating comprises a bond layer and a top layer, the bond layer is formed on a chamber component to reduce the stress between the top layer and the chamber component. The reduced stress decreases or prevents particle shedding from the top layer of the multilayer coating during and after use of the process chamber. The bond layer comprises titanium, titanium nitride, aluminum, or combinations thereof, and the top layer comprises tungsten nitride.

Protection of aluminum process chamber components

One embodiment of the disclosure provides a method of fabricating a chamber component with a coating layer disposed on an interface layer with desired film properties. In one embodiment, a method of fabricating a coating material includes providing a base structure comprising an aluminum or silicon containing material, forming an interface layer on the base structure, wherein the interface layer comprises one or more elements from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and forming a coating layer on the interface layer, wherein the coating layer has a molecular structure of SiYMgAlO. In another embodiment, a chamber component includes an interface layer disposed on a base structure, wherein the interface layer is selected from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and a coating layer disposed on the interface layer, wherein the coating layer has a molecular structure of SiYMgAlO.

Method for fabricating chamber parts

Embodiments of the present disclosure provide protective coatings, i.e., diffusion and thermal barrier coatings, for aluminum alloy substrates. In particular, embodiments described herein provide a protective layer stack comprising a tantalum nitride layer disposed on an aluminum alloy substrate and a ceramic layer disposed on the tantalum nitride layer. In some embodiments, the aluminum alloy substrates comprise processing chambers and processing chamber components used in the field of electronic device manufacturing, e.g., semiconductor device manufacturing. In one embodiment, an article includes a substrate, a tantalum nitride layer disposed on the substrate, and a ceramic layer disposed on the tantalum nitride layer.

Protective layers for processing chamber components

Embodiments of the disclosure provide a chamber component for use in a plasma processing chamber apparatus. The chamber component may include a coating layer that provides a fluorine-rich surface. In one embodiment, a chamber component, for use in a plasma processing apparatus, includes a body having an outer layer comprising yttria having a coating layer formed thereon, wherein the coating layer comprises a yttrium fluoride containing material.

Chemical conversion of yttria into yttrium fluoride and yttrium oxyfluoride to develop pre-seasoned corossion resistive coating for plasma components

The present invention generally relates method and part wear indicator for identifying an eroded chamber component in an etching or other plasma processing chamber. In one embodiment, a chamber component has a part wear indicator. The chamber component has a body. The body has a top surface and a bottom surface. A part wear indicator material is disposed in the chamber component body. The part wear indicator has a body. The body of the part wear indicator has a transparent first layer. A second layer has a tracer material disposed therein and wherein the first layer is closer to the top surface of the top surface than the second layer.

Chamber component part wear indicator and a system for detecting part wear

Embodiments of the disclosure generally relate to a system, apparatus and method for testing a coating over a semiconductor chamber component. In one embodiment, a test station comprises a hollow tube, a sensor coupled to a top end of the tube and a processing system communicatively coupled to the sensor. The hollow tube has an open bottom end configured for sealingly engaging a coating layer of the semiconductor chamber component. The sensor is configured to detect the presence of a gaseous byproduct of a reaction between a reagent disposed in the hollow tube and a base layer disposed under the coating layer. The processing system is configured to determine exposure of the base layer through the coating layer in response to information about the presence of the gaseous byproduct. In another embodiment, the processing system is communicatively coupled to each sensor of a plurality of test stations.

Coating tester using gas sensors

A solar cell containing a plurality of CIGS absorber sublayers has a conversion efficiency of at least 13.4 percent and a minority carrier lifetime below 2 nanoseconds. The sublayers may have a different composition from each other.

Photovoltaic cell with high efficiency CIGS absorber layer with low minority carrier lifetime and method of making thereof

Photovoltaic cell with high efficiency cigs absorber layer with low minority carrier lifetime and method of making thereof

An external clamp ring for a chemical mechanical polishing (CMP) carrier head having a hydrophobic coating, and a carrier head having the same are described herein. In one embodiment, an external clamp ring is provided that includes a cylindrical body having an outer cylindrical wall and an inner cylindrical wall. A hydrophobic layer disposed is on the outer cylindrical wall.

External clamp ring for a chemical mechanical polishing carrier head

The oxygen content of metal species in a heterogeneous catalyst is determined using volumetric adsorption measurements. Such measurements are employed to quantify the amount of reduction gas that it takes to reduce metal species of a catalyst sample, and the oxygen content is derived from this amount and the reaction stoichiometry. This method can be applied to mono-metallic and multi-metallic heterogeneous catalysts and has been shown to provide at least 10 times better detection sensitivity than typical TCDs in TPR-TCD methods.

Determining oxygen content of metal species in heterogeneous catalysts

A catalyst sample may contain both small and large metal particle distributions simultaneously. Characterizing the properties of the metal particles contained in each distribution is important to help describe catalytic performance and optimize catalysts. Monte Carlo simulations and dispersion measurements are employed to determine the relationship between dispersion parameters of each metal particle distribution. Various properties, such as the atom fraction and the surface atom fraction of each distribution can be determined.

Characterization of metal particle distributions in a supported catalyst

A relationship between dispersion and surface-averaged metal particle size is provided so that either dispersion can be determined from measured surface-averaged metal particle size or surface-averaged metal particle size can be determined from measured dispersion. The method can be applied to catalysts having a single metal species as well as catalysts having multiple metal species. The size of the supported metal particles in the catalyst sample may be determined using transmission electron microscopy images of supported metal particles in the catalyst sample. The dispersion of the supported metal particles in the catalyst sample may be determined using chemisorption tests on the catalyst sample.

Dispersion and metal particle size characterization of nanocatalysts

Three-dimensional (3D) shapes of particles are characterized from a two-dimensional (2D) image of the particles that is obtained using TEM. The 3D shape characterization method includes the steps of obtaining a 2D image of a batch of nanoparticles, determining 2D shapes of the nanoparticles from the 2D image, and deriving six distributions, each of which corresponds to a 2D shape and a 3D shape associated with the 2D shape. The first size distribution is derived from the nanoparticles having the 2D triangle shape. The second and third size distributions are derived from the nanoparticles having the 2D tetragon shape. The fourth, fifth and sixth size distributions are derived from the nanoparticles having the 2D round shape. Based on these six size distributions, three size distributions, each of which corresponds to one of three 3D shape classes, are estimated. The size distributions corresponding to the 3D shape classes provide a better log-normal distribution than the size distributions corresponding to the 2D shapes.

Particle shape characterization from 2D images

A sample preparation method for characterization of nanoparticles embedded in the supports of heterogeneous catalysts, with improved particle dispersion, is introduced. The supported catalyst is first ground or milled into fine powder. Then, the powder is mixed into an organic solvent, and an etchant is added to the solvent to digest the supports and release metallic nanoparticles. The resulting solution is then placed in an ultrasonic bath where ultrasonic waves are generated and applied to the solution. The ultrasonic waves suppress agglomeration of the particles and also break up those particle clusters resulting from agglomeration during the prior steps. Subsequently, a sample is extracted from the solution and prepared for analysis.

Dissolving metal particles from supported catalyst using ultrasonic energy, solvent and etchant

The catalytic efficiency of supported catalysts containing metal nanoparticles is strongly related to the chemical softness at the surfaces of such nanoparticles. Supported catalysts containing platinum nanoparticles having average surface softness values (expressed in scaled units ranging from 0 to 1) between 0.07198 and 0.09247 exhibit high catalytic efficiency. The catalytic efficiency of such platinum nanoparticles for CO oxidation, expressed as the turn-over frequency (TOF), was observed to be on or above 0.03062 s. The supported catalysts containing platinum nanoparticles with tighter average surface softness ranges exhibit even higher catalytic efficiencies. The TOF for CO oxidation of platinum nanoparticles having average surface softness values between 0.08031 and 0.08679 was observed to be on or above 0.06554 s.

Supported catalysts having platinum particles

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Sunnyvale, CA, United States of America

Mats Larsson