Fotona D.o.o.

Renishaw Plc

Rls Merilna Tehnika D.o.o.

Institut Jozef Stefan

Univerza V Ljubljani, Fakulteta Za Strojnistvo

Yaskawa Slovenija D.o.o

Matija Jezersek

Matjaz Lukac

Nejc Lukac

Peter Gregorcic

Peter Kogej

Ales Mrzel

Ales Babnik

Janez Mozina

Janez Diaci

Daniele Vella

Petec Gregorcic

Hubert Kosler

Jenez Mozina

The application relates to a cleaning system configured for cleaning of cavities filled with a liquid, including fragmentation, debridement, material removal, irrigation, disinfection, and decontamination. The cleaning system includes an electromagnetic radiation system and a liquid. A treatment handpiece irradiates the liquid within a cavity with a radiation beam, producing a first vapor bubble using first pulse, and, at a different location, a second vapor bubble using a second pulse. The pulse repetition time is adjusted to ensure efficacy, for example such that an onset time of the second vapor bubble is within the first contraction phase of the first vapor bubble, when the first vapor bubble has contracted from its maximal volume to a size in a range from about 0.7 to about 0.1 of the maximal volume.

Cleaning system and method for operating the cleaning system

A method and apparatus are described for forming a pattern including one or more markings on a substrate. The method includes the step of forming each marking by locally heating the substrate, for example using a fibre laser. A step is also performed of monitoring the temperature of the substrate, e.g. using a temperature sensor, whilst each marking is being formed. The method may be used to form a magnetic encoder scale on a stainless steel substrate having a high content of martensitic material. The local heating causes the martensitic material to be transformed into austenitic material. An encoder scale made using the method is also described.

Apparatus and method for writing a pattern in a substrate

Growing community of inventors

Radomlje, Slovenia

Matija Jezersek