Stmicroelectronics (rousset) Sas

Sgs-thomson Microelectronics S.a.

Stmicroelectronics S.a.

Stmicroelectronics (crolles 2) Sas

Stmicroelectronics (research & Development) Limited

Stmicroelectronics (alps) Sas

Stmicroelectronics S.r.l.

Stmicroelectronics Gmbh

Stmicroelectronics (grenoble 2) Sas

Mathieu Pierre Lisart

Alexandre Sarafianos

Fabrice Marinet

Pascal Fornara

Nicolas Borrel

Benoit Froment

Christian Rivero

Jimmy Fort

Abderrezak Marzaki

Fabrice Romain

Guilhem Bouton

Laurent Sourgen

Sylvie Wuidart

Richard P Fournel

Nicolas Demange

Bruce Rae

Patrick Arnould

Hubert Degoirat

Francesco La Rosa

Federico Pio

Thierry Soude

Raul Andres Bianchi

Nicola Zatelli

Sebastien Petitdidier

Christophe Laurencin

Clement Champeix

Tien-Dung Do

Marc Mantelli

Julien Mercier

Benoît Froment

Benoit Durand

Olivier Gagliano

Jean-Marc Voisin

Sébastien Petitdidier

Massimo Cervetto

Thierry Soudé

Vincent Pouget

Mathieu Dumont

Francedillaois Guette

Benoït Froment

The present description concerns a ROM including at least one first rewritable memory cell. In an embodiment, a method of manufacturing a read-only memory (ROM) comprising a plurality of memory cells is proposed. Each of the plurality of memory cells includes a rewritable first transistor and a rewritable second transistor. An insulated gate of the rewritable first transistor is connected to an insulated gate of the rewritable second transistor. The method includes successively depositing, on a semiconductor structure, a first insulating layer and a first gate layer, wherein the first insulating layer is arranged between the semiconductor structure and the first gate layer, wherein the rewritable second transistor further includes a well-formed between an associated first insulating layer and the semiconductor structure, and wherein the rewritable first insulating layer is in direct contact with the semiconductor structure; and successively depositing a second insulating layer and a second gate layer.

Read only memory

The present description concerns a ROM including at least one first rewritable memory cell.

A physically unclonable function device includes a set of diode-connected MOS transistors having a random distribution of respective threshold voltages. A first circuit is configured to impose, on each first transistor, a fixed respective gate voltage regardless of the value of a current flowing in this first transistor. A second circuit is configured to impose, on each second transistor, a fixed respective gate voltage regardless of the value of a current flowing in this second transistor. A current mirror stage is coupled between the first circuit and the second circuit and is configured to deliver the reference current from a sum of the currents flowing in the first transistors. A comparator is configured to deliver a signal whose level depends on a comparison between a first current obtained from a reference current based on the first transistors and a second current of the second transistors.

Physically unclonable function device

A method for detecting a reading error of a datum in memory. A binary word which is representative of the datum and an error correcting or detecting code is read by: reading a first part of the binary word stored at a first address in a first memory circuit; and reading a second part of the binary word stored at a second address in a second memory circuit. The first and second parts read from the first and second memory circuits, respectively, are concatenated to form a read binary word. The datum is then obtained by removing the error correcting or detecting code from the read binary word. A new error correcting or detecting code is calculated from the obtained datum and compared to the removed error correcting or detecting code to detect error in the obtained datum.

Error detection

An integrated circuit includes a first domain supplied with power at a first supply voltage. A first transistor comprising in the first domain includes a first gate region and a first gate dielectric region. A second domain is supply with power at a second supply voltage and includes a second transistor having a second gate region and a second gate dielectric region, the second gate region being biased at a voltage that is higher than the first supply voltage. The first and second gate dielectric regions have the same composition, wherein that composition configures the first transistor in a permanently turned off condition in response to a gate bias voltage lower than or equal to the first supply voltage. The second transistor is a floating gate memory cell transistor, with the second gate dielectric region located between the floating and control gates.

Integrated circuit provided with decoys against reverse engineering and corresponding fabrication process

A method for detecting a writing error of a datum in memory includes: storing at least two parts of equal size of a binary word representative of said datum at the same address in at least two identical memory circuits, and comparing internal control signals of the two memory circuits to determine existence of the writing error.

An embodiment integrated circuit includes a first electromagnetic pulse detection device that comprises a first loop antenna formed in an interconnection structure of the integrated circuit, a first end of the first antenna being connected to a first node of application of a power supply potential and a second end of the antenna being coupled to a second node of application of the power supply potential, and a first circuit connected to the second end of the first antenna and configured to output a first signal representative of a comparison of a first current in the first antenna with a first threshold.

Electromagnetic pulse detection

A datum is written to a memory, by splitting a binary word, representative of the datum and an error correcting or detecting code, into a first part and a second part. The first part is written at a logical address in a first memory circuit. The second part is written at the logical address in a second memory circuit. The error correcting or detecting code is dependent on both the datum and the logical address.

An electronic integrated circuit chip includes a semiconductor substrate with a front side and a back side. A first reflective shield is positioned adjacent the front side of the semiconductor substrate and a second reflective shield is positioned adjacent the back side of the semiconductor substrate. Photons are emitted by a photon source to pass through the semiconductor substrate and bounce off the first and second reflective shields to reach a photon detector at the front side of the semiconductor substrate. The detected photons are processed in order to determine whether to issue an alert indicating the existence of an attack on the electronic integrated circuit chip.

Protected electronic integrated circuit chip

The physically unclonable function device (DIS) comprises a set of MOS transistors (TR, TR) mounted in diodes having a random distribution of respective threshold voltages, and comprising N first transistors and at least one second transistor. At least one output node of the function is capable of delivering a signal, the level of which depends on the comparison between a current obtained using a current circulating in the at least one second transistor and a current obtained using a reference current that is equal or substantially equal to the average of the currents circulating in the N first transistors. A first means (FM) is configured to impose on each first transistor a respective fixed gate voltage regardless of the value of the current circulating in the first transistor, and a second means (SM) is configured to impose a respective fixed gate voltage on each second transistor regardless of the value of the current circulating in the second transistor.

An integrated circuit includes a semiconductor substrate and a multitude of electrically conductive pads situated between component zones of the semiconductor substrate and a first metallization level of the integrated circuit, respectively. The multitude of electrically conductive pads are encapsulated in an insulating region and include: first pads, in electrical contact with corresponding first component zones, and at least one second pad, not in electrical contact with a corresponding second component zone.

Method for forming at least one electrical discontinuity in an integrated circuit, and corresponding integrated circuit

An integrated device for physically unclonable functions is based on a set of MOS transistors exhibiting a random distribution of threshold voltages which are obtained by lateral implantations of dopants exhibiting non-predictable characteristics, resulting from implantations through a polysilicon layer. A certain number of these transistors form a group of gauge transistors which makes it possible to define a mean gate source voltage making it possible to bias the gates of certain others of these transistors (which are used to define the various bits of the unique code generated by the function). All these transistors consequently exhibit a random distribution of drain-source currents and a comparison of each drain-source current of a transistor associated with a bit of the digital code with a reference current corresponding to the average of this distribution makes it possible to define the logical value 0 or 1 of this bit.

Integrated physically unclonable function device with a set of transistors exhibiting a random distribution of threshold voltages

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Aix-en-Provence, France

Mathieu Pierre Lisart