Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Muegge Gmbh

Toho Tenax Co., Ltd.

Toho Tenax Europe Gmbh

Mathias Kaiser

Peter Elsner

Rudolf Emmerich

Bernd Wohlmann

Klaus-Martin Baumgärtner

Horst Muegge

Eberhard Räuchle

Konstantin Räuchle

Klaus Martin Baumgärtner

Lukas Alberts

Urban Helfried

Christian Hunyar

Ralf Dreher

Matthias Graf

Klaus-Dieter Nauenburg

Frank Henning

Michael Wölki

A device is provided for generating plasma by microwaves for CVD coating a substrate having a vacuum container into which a reaction gas can be fed and an electrical conductor arranged therein which is connected on each of both ends thereof to a device for coupling microwaves and to a voltage source with which a difference of potential can generated between the electrical conductor and the surrounding vacuum container. The electrical conductor is electrically insulated from the devices for coupling microwaves. The electrical conductor has a rod-shaped design or a curved run. The electrical conductor is connected to the voltage source via a feedthrough filter. The device for coupling microwaves expands in a funnel shape toward the electrical conductor and is partially or completely filled by a dielectric material. The device for coupling microwaves has groove-shaped recesses running along a circumference.

Device for generating plasma by means of microwaves

The aim of the invention is to provide an alternative to the intensive treatment of a product, especially plasma treatment, in specific areas only. Towards this end, the invention provides a device for producing microwaves for treating workpieces, comprising at least one microwave antenna with an extended conductor for producing alternating electromagnetic fields, a housing that substantially extends over the length of the conductor, and an extended microwave decoupling area which follows the conductor and which is located in the housing. The housing is formed by at least one resonant cavity, which has a long shape and follows the course of the microwave antenna. The resonant cavity has at least one tapering, closed, first crown area and the decoupling area essentially extends in the focussing area of the resonant cavity. An at least non-divergent housing area adjoins the resonant cavity.

Linearly extended device for large-surface microwave treatment and for large surface plasma production

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Karlsbad, Germany

Mathias Kaiser