Ims Nanofabrication Ag

Institut Fur Mikroelektronik

Mathias Irmscher

Elmar Platzgummer

Reinhard Springer

Florian Letzkus

Hans Löschner

Samuel Kvasnica

Jörg Butschke

The invention relates to a multi-beam deflector array device for use in a particle-beam exposure apparatus employing a beam of charged particles, the multi-beam deflector array device having a plate-like shape with a membrane region, the membrane region including a first side facing towards the incoming beam of particles, an array of apertures, each aperture allowing passage of a corresponding beamlet formed out of the beam of particles, a plurality of depressions, each depression being associated with at least one aperture, and an array of electrodes, each aperture being associated with at least one electrode and each electrode being located in a depression, the electrodes being configured to realize a non-deflecting state, wherein the particles that pass through the apertures are allowed to travel along a desired path, and a deflecting state, wherein the particles are deflected off the desired path.

Multi-beam deflector array device for maskless particle-beam processing

Growing community of inventors

Renningen, Germany

Mathias Irmscher