Agfa-gevaert Ag

Hoechst Aktiengesellschaft

Agfa Gevaert Nv

Agfa-gevaert

Clariant Corporation

Afga-gevaert Aktiengesellschaft

Mathias Eichhorn

Gerhard Buhr

Andreas Elsaesser

Fritz-Feo Grabley

Gabor I Koletar

Helmuth Haberhauer

Douglas A Seeley

Otfried Gaschler

Michael Brenk

Thomas Leichsenring

Karin Maerz

Helmut Haberhauer

A recording material for producing offset printing plates includes: a support having a hydrophilic surface, and an infrared-imageable layer including a) a component which is capable of absorbing infrared radiation and converting the infrared radiation to heat, b) a compound which is capable of releasing acid under the action of the heat generated by component a), and c) a polymeric binder having at least one group which is cleaved by the acid released from the compound b), and at least one hydrophilic group, and wherein the layer becomes soluble in an aqueous-alkaline developer in areas struck by infrared radiation.

Infrared-imageable recording material and offset printing plates produced from it

A positive-working or negative-working radiation-sensitive mixture includes as an IR absorbing component a carbon black pigment having a primary particle size smaller than 80 nm. The carbon black pigment is predispersed in a polymer containing acidic units having a pK.sub.a of less than 13. The radiation-sensitive component may include an ester of (i) a 1,2-naphthoquinone-2-diazide-4-sulfonic acid or a 1,2-naphthoquinone-2-diazide-5-sulfonic acid and (ii) a compound having at least one phenolic hydroxyl group, such as 3 to 6 phenolic hydroxyl groups. After imagewise radiation exposure, the recording material including the radiation-sensitive mixture can be developed without difficulties in an aqueous alkaline solution without leaving residual coating on the areas that became soluble or that remained soluble upon exposure.

Radiation-sensitive mixture and recording material made thereof for

A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

Radiation-sensitive mixture

Thermally imageable material, consisting of a substrate and two layers (a) and (b) built up thereon in the stated sequence:

Thermally imageable material

The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and III

Positive-working radiation-sensitive mixture

The invention relates to aromatic or heteroaromatic mono- or bis-diazonium 1,1,2,3,3,3-hexafluoro-propanesulfonates. They are employed in positive-working or negative-working radiation-sensitive mixtures which are used for coating radiation-sensitive recording material.

Aromatic hexafluoropropanesulfonate diazonium salts and their use in

A polymer comprising repeating units of the formula ##STR1## wherein R.sup.1 , R.sup.2 and R.sup.3 are, independently of one another, hydrogen atoms or alkyl groups,

Polymers and photosensitive mixture prepared therewith

A mechanically and/or electrochemically grained and optionally anodized base material composed of aluminum or its alloys, to which a hydrophilic layer of at least one polymer containing basic and acidic groups is applied. This layer is followed by a further hydrophilic layer which contains at least one compound containing at least one phosphono group. In addition, the invention relates to a method of producing said carrier material and to photosensitive recording material for offset printing plates produced therewith.

Hydrophilized base material and recording material produced therefrom

The invention relates to N,N-disubstituted sulfonamides of the formulae R.sup.1 [--N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 ].sub.n (I) and R.sup.1 [--SO.sub.2 --N(CO--OR.sup.2)--R.sup.3 ].sub.n (II), in which R.sup.1 --for n=1--is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14) aryl or (C.sub.7 -C.sub.20)aralkyl radial, for n&gt;1--the 2-, 3- or 4-valent radical of a (C.sub.1 -C.sub.20)alkane or (C.sub.6 -C.sub.7)cycloalkane, a non-condensed or condensed mono- or polynuclear (C.sub.6 -C.sub.18)aromatic compound, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11)alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical. The invention further relates to a positive radiation-sensitive mixture containing a) a compound which under the influence of actinic radiation forms acid, b) an acid-cleavable compound whose cleavage products in an aqueous alkaline developer have a higher solubility than the starting compound, and c) a polymeric binder which is insoluble in water but is soluble or at least swellable in aqueous alkaline solutions, in which the compound b) is a sulfonamide of the formula I or II. The mixture according to the invention is particularly suitable for the manufacture of offset printing plates and photoresists.

N,N-disubstituted sulfonamides and radiation-sensitive mixture prepared

The invention relates to monomers of the formulae R.sup.1 -SO.sub.2 -N(CO-OR.sup.2)-R3-O-CO-CR.sup.4 =CH.sub.2 and R.sup.1 -N(CO-OR.sup.2) -SO.sub.2 -R.sup.3 -O-CO-CR.sup.4 =CH.sub.2, in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, C.sub.3 -C.sub.11) alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) -R.sup.3 -N(CO-OR.sup.2)-SO.sub.2 -R.sup.1 (I) and/or -R.sup.3 -SO.sub.2 -N(CO-OR.sup.2)-R.sup.1 (II), and to a radiation-sensitive mixture which contains: a) a compound which under the influence of actinic radiation forms acid, and b) an acid-cleavable compound whose cleavage products in an aqueous-alkaline developer have a higher solubility than the starting compound, in which the acid-cleavable compound is a polymer of the abovementioned type, and to a recording material comprising a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for preparing offset printing plates and photoresists.

Polymers having N,N-disubstituted sulfonamide pendent groups and use

The invention relates to monomers of the formulae

The invention relates to a process for preparing organic monomeric or polymeric compounds carrying tert-butyloxycarbonyl groups, wherein a monomeric or polymeric organic compound, which possesses at least one heteroatom with an acidic proton, such as an aliphatic or aromatic alcohol, an amide, imide or lactam, is reacted with di-tert-butyl dicarbonate in an inert solvent in the presence of about 0.01 to about 10 mol percent, relative to the compound to be converted, of a catalyst at a temperature from about 0.degree. to about 80.degree. C. The reaction solution can be used for further processing, or the reaction product can be isolated by evaporation of the solvent or by precipitation in water and drying. The compounds are preferably used in light-sensitive coatings.

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Niedernhausen, Germany

Mathias Eichhorn