Hitachi, Ltd.

Other

Hitachi Device Engineering Co., Ltd.

Hitachi Electronic Devices Co., Ltd.

Hitachi Nisshin Electronics Co., Ltd.

Masumi Kuga

Toshio Ogura

Tomokatsu Oguro

Noboru Baba

Masami Taguchi

Kazutaka Okamoto

Seiji Kitakaze

Yuichi Ito

Toru Moriike

Iwao Umeki

In a microwave irradiation apparatus, an applicator portion has an interior space for housing an object to be irradiated. A first microwave irradiation system outputs a first microwave to the interior space in a first mode so as to generate a large electric field and a small magnetic field at a specific place of the interior space. A second microwave irradiation system outputs a second microwave having a polarization plane crossing a polarization plane of the first microwave to the interior space in a second mode so as to generate a large magnetic field and small electric field at the specific place of the interior space.

Microwave irradiation apparatus

A microwave irradiation system includes first and second microwave generators, and an applicator which includes: a microwave transmission part connected to the first and second microwave generators; a reflecting plane, at an other end of the microwave transmission part of the applicator, configured to reflect microwaves from the first and the second microwave generators at such a location that a space of an object, in the microwave transmission part of the applicator between the end and the other end is irradiated with both a greater intensity of electric field and a smaller intensity of magnetic field generated by the first microwave generator and with both a greater intensity of magnetic field and a smaller intensity of electric field generated by the second microwave generator; and a filter part through which at least one of the first and second microwave generators is connected to the applicator.

Microwave irradiation system

A magnetron has an anode cylinder, a plurality of vanes extending radially inwardly from the anode cylinder, a cathode filament extending along a center axis of the anode cylinder, an output section including an antenna coupled to one of the vanes, and a magnetic circuit section for supplying a magnetic field into the anode cylinder, whereby the magnetron oscillates at a fundamental frequency in a range from 400 MHz to 600 MHz.

Magnetron having a lowered oscillation frequency and processing equipment employing the same

A magnetron having eight anode vanes (2) arranged radially inside an anode cylinder (3) and a helically coiled, directly heated filament positioned along the anode cylinder. The magnetron oscillates at a basic frequency of 2450 MHz. The external diameter of the helically coiled, directly heated filament is in the range of 2.6 to 3.2 mm, and the diameter between the internal ends of the anode vanes is in the range of 7.0 to 8.0 mm.

Magnetron with improved mode separation

There is disclosed a magnetron whose oscillation frequency can be easily adjusted. The magnetron comprises a cylindrical anode, several anode vanes radially arranged around the axis of the anode, and two strap rings of the same structure. Alternate ones of the anode vanes are connected together by one of the strap rings. The remaining anode rings are connected together by the other strap ring. The two strap rings are displaced circumferentially relative to each other by a given angle centering around the axis of the anode.

Magnetron having identically shaped strap rings separated by a gap and

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Mutsuzawa, Japan

Masumi Kuga