Kla Tencor Corporation

Onwafer Technologies, Inc.

Xradia, Inc.

Mason L Freed

Costas J Spanos

Randall S Mundt

Paul Douglas MacDonald

Andrew Beers

Michael D Welch

Dean Hunt

Wenbing Yun

Frederick William Duewer

Kameshwar Poolla

Ying Xu

Michiel V P Krüger

Chao-chih Hsu

A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and may include a transducer coupled to the at least one sensing element. The transducer can be configured to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor.

Methods of and apparatuses for measuring electrical parameters of a plasma process

Methods of and apparatuses for maintenance, diagnosis, and optimization of processes

The position of the sample is measured and used to correct for any off-axis motion during tomography using x-ray projection microscope system with a rotation stage system. The position is sensed using a precision-machined, low-CTE gold-coated cylinder or disc and three to five capacitive distance sensors. The correction can then be performed purely as image processing in software, by applying an appropriate shift in X and Y of the captured x-ray projections. A calibration is often necessary for each system (gold disc plus sensors plus sample stage) to account for any machining errors of the gold disc or positioning errors of the capacitive sensors. This calibration should also be repeated whenever any maintenance is performed on the metrology setup.

Method and system for tomographic projection correction

A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and at least one transducer coupled to the at least one sensing element. The transducer is configured so as to receive a signal from the sensing element and converting the signal into a second signal for input to the information processor.

One aspect of the present invention is a method of monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. Another aspect of the present invention is a system configured for monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. One embodiment of the present invention includes a software program that can be implemented in a computer for optimizing the performance of a process tool for processing a workpiece.

Presented are methods, systems, and apparatuses for managing and maintaining an electronic device such as a sensor apparatus.

Sensor apparatus power transfer, communication and maintenance methods and apparatus

One or more problems related to processing workpieces using processes that involve optical radiation are presented along with solutions to one or more of the problems. One embodiment of the invention comprises a sensor apparatus for collecting optical radiation data representing one or more process conditions used for processing a workpiece. In a further embodiment, the sensor apparatus is also configured for measuring data other than optical radiation.

Apparatuses for and methods of monitoring optical radiation parameters for substrate processing operations

This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.

Methods and apparatus for low distortion parameter measurements

Maintenance unit for a sensor apparatus

A method of producing a time delay is provided. The method is performed with an information processor having a first timer and a second timer. The information processor is capable of maintaining a sleep mode. The method involves using the second timer to measure the timeout for the first timer. The method also includes repetitively causing the information processor to enter the sleep mode so as to be awakened by the first timer reaching timeout to substantially produce a time delay while the second timer is disabled.

Methods and apparatus for low power delay control

Information transfer is effected using a network of electrical signal conductors and sensors forming crosspoint connections. The sensors are capable of representing a measurement parameter as an electrical impedance. One embodiment of the present invention includes output electrical conductors, input electrical conductors, and sensors. Each of the sensors is connected with one of the output electrical conductors and one of the input electrical conductors so as to form an array of crosspoint connections. Application of electrical signals to the sensors and measurement of electrical signals from the sensors provide sufficient information to derive relative information corrected for parasitic current sources for each sensor using algorithms based on equations for combining impedance. The embodiment may further include one or more reference elements connected with the output electrical conductors and with the input electrical conductors so as to form crosspoint connections. The reference elements have predetermined impedances and may be used to determine the impedance values for particular sensors.

Data collection methods and apparatus with parasitic correction

Data are collected for deriving response models and information required for developing and maintaining processes and process tools. Methods and apparatus for collecting the data include a sensor apparatus capable of collecting data with less perturbation and fewer disruptions than is usually possible using standard methods. The sensor apparatus is capable of being loaded into a process tool. From within the process tool, the sensor apparatus is capable of measuring data, processing data, storing data, and transmitting data. The sensor apparatus has capabilities for near real time data collection and communication.

Methods and apparatus for obtaining data for process operation, optimization, monitoring, and control

Described are methods and apparatus that can provide increased power use efficiency for some applications of wireless telecommunications devices. An aspect of the present invention includes an apparatus for wireless communication. The apparatus includes a wireless communication system powered with a limited capacity power source. The apparatus is capable of controlling the power applied to the communication system so as to increase the efficiency for using the power. Another aspect of the present invention is a method of controlling power use for wireless telecommunications with a limited capacity power source.

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Pleasant Hill, CA, United States of America

Mason L Freed