Nitto-denko Corporation

Masayuki Yamamoto

Yasuji Kaneshima

Saburo Miyamoto

Yukitoshi Hase

Takao Matsushita

Satoshi Ikeda

Naoki Ishii

Takeshi Matsumura

Chouhei Okuno

Eiji Toyoda

Makoto Namikawa

Shigeji Kuroda

Masaru Irie

Noriyoshi Nagata

Takashi Nishinohama

Masaki Sakata

Koichi Hashimoto

Hiroshi Noro

Takayuki Yamamoto

Minoru Ametani

Yasuo Kihara

Koji Akazawa

Yuji Okawa

Chiaki Harada

Tatsuya Kubozono

Yasuhiko Yamamoto

Norio Mori

Kazuo Morimoto

Atsushi Ogawa

Tatsuya Sekido

A workpiece is unloaded from a wafer-receiving container. A first discriminating sensor detects a front surface of the workpiece, and determines either a semiconductor wafer or a spacer is the workpiece. Where the workpiece is a wafer, the first discriminating sensor also determines whether or not a protective tape is on the front surface of the workpiece. Where it is determined that a protective tape is not on the front surface, a second discriminating sensor detects a back surface of the wafer for discriminating the presence or absence of the protective tape.

Semiconductor wafer mounting method and semiconductor wafer mounting apparatus

A resin sealing sheet is cut into an adhesive sheet piece having an outer shape smaller than that of a wafer. The adhesive sheet piece is joined to a supporting adhesive tape together with a ring frame. The adhesive tape between the ring frame and the adhesive sheet piece is sandwiched by upper and lower housings to form a chamber. The wafer with a support board placed on a wafer holding table within the chamber faces to the adhesive sheet piece closely. The chamber is divided into two spaces by the adhesive tape. Differential pressure generated within the two spaces causes the adhesive tape and the adhesive sheet piece to cave and bend toward the wafer, whereby the adhesive sheet piece is joined to the wafer.

Method of mounting a semiconductor wafer with a support board on a supporting adhesive tape joined to a ring frame

A semiconductor wafer joined to a carrier via a double-faced adhesive tape having an adhesive layer of a heating separation property is heated for removal from the carrier. The double-faced adhesive tape is separated from the semiconductor wafer on a holding table. Thereafter, an air nozzle preliminarily cools the semiconductor wafer for a given time during transportation with a wafer transport section. Upon completion of the preliminary cooling, the semiconductor wafer is placed on a cooling stage to cool it to a target temperature.

Semiconductor wafer transport method and semiconductor wafer transport apparatus

A collection bobbin is provided on a vertical line that travels a center of a supply bobbin. A pair of connection mechanisms is provided at front both sides of a tape housing chamber. An adhesive tape transport carriage with connection portions at a forward end of a carriage frame is connected to the connection mechanisms in the apparatus body. Loading of a master roll of an adhesive tape to the supply bobbin and unloading of a roll of a residual cut tape may be performed at the same position.

Adhesive tape joining apparatus

A first holding table suction-holds an annular projection of a wafer remaining on a rear face thereof for surrounding a back grinding region. A second holding table having an outer peripheral wall adjacent to an inner wall of the annular projection is inserted into a flat portion inside the annular projection for joining a separating adhesive tape to a protective tape on a surface of the wafer while a flat plane of the flat portion is suction-held. Thereafter, the adhesive tape is separated. Accordingly, the adhesive tape is separated from the surface of the wafer together with the protective tape.

Method and apparatus for separating protective tape

A joint detector detects a joint in an adhesive tape supplied from a tape supply section, and a computing unit determines a suitable cutting position of the adhesive tape for removing the joint in accordance with the detected results. A controller controls each mechanism to operate so as to satisfy the determined results by the computing unit. Thereafter, the adhesive tape including the joint is cut and removed.

Adhesive tape joining method and adhesive tape joining apparatus

Tape heating means is allowed to come close to an adhesive tape for support and, in a heating state, the adhesive tape for support is stretched and tensioned with proper tension in a tape width direction and a transport direction. A heated work is bonded to an adhesive face of the tensioned adhesive tape for support, thereby supporting the work.

Work bonding and supporting method and work bonding and supporting apparatus using the same

Prior to applying of ultraviolet rays to a surface of a wafer with a protective tape joined thereto that is placed and held on a holding table, an illumination sensor moves to a position below an ultraviolet irradiation unit having ultraviolet light emitting diodes arranged in one dimensional array to measure ultraviolet intensity in a position corresponding to a surface of the protective tape, and output voltage of each diode is controlled so as to maintain a uniform accumulated quantity of light in an area of the protective tape where ultraviolet rays are applied that is determined from the result of measurement and a turning velocity of the holding table.

Ultraviolet irradiation device

A cutter blade is relatively moved along an outer periphery of a semiconductor wafer, and dust generated at a tape cutting site by the cutter blade and attached to an upper surface of the protective tape is collected with a dust collecting member which relatively moves with the cutter blade with respect to the semiconductor wafer, and the dust collected at a predetermined portion is suctioned and removed with a suction nozzle after the completion of tape cutting.

Protective tape cutting method for semiconductor wafer and device of the same

A cutter blade is cut-in by being moved towards a deep part of a notch from one open end of the notch while being moved in a forward direction with respect to an outer periphery of a wafer. Immediately before a blade edge reaches the deep part of the notch, cutting movement of the cutter blade is once stopped, reversely moved to a initial piercing position, and thereafter, the cutter blade is moved towards the deep part of the notch from the other open end of the notch while being moved in a reverse direction with respect to the outer periphery of the wafer.

Method for cutting protective tape of semiconductor wafer and protective tape cutting device

A surface height of a protective tape joined to a wafer mounted and held on a separation table is detected, an operation amount of approaching a joining member to the protective tape until a separation tape wound around the joining member contacts the protective tape based on detected information, the joining member is operation controlled to approach the protective tape based on the calculated operation amount, the joining member and the separation table are relatively moved along a direction of a surface of the protective tape in a state of maintaining the height of the joining member to join the separation tape to the protective tape, and the separation tape is separated from the surface of the wafer integrally with the protective tape.

Protective tape separation method and protective tape separation apparatus

A surface height of a protective tape joined to a wafer mounted and held on a separation table is detected, a lowering operation distance of a needle is calculated based on such detected information, and a lowering operation amount for approaching a joining member to the protective tape until the separation tape winded around the joining member contacts the protective tape is calculated. A separating site is formed in the protective tape and the protective tape is separated while controlling a height of each member based on the calculated lowering operation amount.

Protective tape separation method and apparatus using the same

A cutter blade movably in a radial direction of a wafer is pressed for biasing to an outer circumferential edge of the semiconductor wafer. Simultaneously, the pushing biasing force of the cutter blade is controlled constant with automatic regulation corresponding to a traveling speed variation of the cutter blade, so that effect of a centrifugal force that works at the time of rotating travel of the cutter blade may not vary a pushing biasing force of the cutter blade. As a result, a contact pressure of the cutter blade to the outer circumferential edge of the semiconductor wafer is maintained stable.

Method for cutting protective tape of semiconductor wafer and apparatus for cutting the protective tape

A method of this invention involves capturing an image of an outer periphery of a semiconductor wafer, by use of a CCD camera, performing image analysis on data about the captured image, detecting defects such as chips and cracks on the outer periphery of the semiconductor wafer, storing positions of the respective defects, calculating a clearance between the adjacent defects from information about the stored positions, comparing the calculated clearances with a preset width of a separation tape, and obtaining the clearance larger than the width of the separation tape, by arithmetic processing. If some of the clearances are larger than the width of the separation tape, this method also involves setting an appropriate one of the clearance as a position where the separation tape is joined, performing alignment on the semiconductor wafer, joining the separation tape to a protective tape joined to a surface of the semiconductor wafer, and separating the protective tape together with the separation tape from the surface of the semiconductor wafer.

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Osaka, Japan

Masayuki Yamamoto