Canon Kabushiki Kaisha

Masayuki Tanabe

Yasuyuki Tamura

Yukio Hanyu

Toshiki Ito

Yutaka Watanabe

Niyaz Khusnatdinov

Weijun Liu

Shigeru Terashima

Yasuaki Fukuda

Masami Tsukamoto

Timothy Brian Stachowiak

Hitoshi Nakano

Keita Sakai

Setsuo Yoshida

Tomonori Otani

Mika Kanehira

A pattern is formed on a substrate with forming a layer of a curable composition (A) containing a component (a) serving as a polymerizable compound on a surface of the substrate, then dispensing droplets of a curable composition (A) containing a component (a) serving as a polymerizable compound (a) and a component (b) serving as a photopolymerization initiator dropwise discretely onto the layer of the curable composition (A), subsequently sandwiching a mixture layer of the curable composition (A) and the curable composition (A) between a mold and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and then releasing the mold from the mixture layer after the curing.

Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold

A determination method for determining a pattern of a mold is disclosed. The pattern of the mold is used in imprint processing of forming a pattern on imprint material by performing the steps of pressing the imprint material on a substrate against the pattern of the mold in an atmosphere containing condensable gas to be liquefied due to compression, curing the imprint material, and releasing the mold from the imprint material. A processor calculates a shrinkage amount of the pattern on the imprint material. The pattern on the imprint material shrinks by desorbing condensate liquid, which is produced through liquefaction of the condensable gas between the imprint material and the pattern of the mold in the pressing step and which is dissolved in the imprint material, from the imprint material after completion of the pressing step.

Method for determining pattern of mold for imprint, imprint method, and apparatus

An imprint apparatus of the present invention that molds and cures an imprint material on a substrate using a mold to form a pattern on the substrate. The imprint apparatus includes a supply unit configured to supply a gas into a gap between the imprint material on the substrate and the mold. The supply unit is configured to supply a mixed gas in which a permeable gas, which permeates at least one of the mold, the imprint material and the substrate, and a condensable gas, which is liquefied under a pressure generated by the molding, is mixed with each other.

Imprint apparatus and article manufacturing method

An exposure apparatus that includes a chamber in which an optical element, including a capping layer, is arranged, and that exposes a substrate to exposure light via the optical element. The apparatus includes a supply unit configured to supply a material into the chamber and a providing unit configured to provide electromagnetic waves to the capping layer. The apparatus is configured so that the electromagnetic waves provided by the providing unit cause a photochemical reaction of the material, to grow a layer on the capping layer, with at least one of a condition of supply of the material by the supply unit and a condition of provision of the electromagnetic waves by the providing unit being changed in accordance with each position of the capping layer, based on information of a decrease in an amount of the capping layer at each position, so as to repair the capping layer.

Exposure apparatus, control method for the same, and device manufacturing method

Disclosed is an exposure apparatus which includes an optical element, a gas supplying unit for supplying a predetermined gas around the optical element, and an organic compound decomposition mechanism for decomposing an organic compound in the gas. This structure prevents adhesion of organic compounds to the optical element without a necessity of using many filters in combination.

Exposure apparatus, and device manufacturing method

An optical instrument includes an optical element and a detector for detecting an impurity concentration in an ambience containing a space surrounding the optical element. By controlling the impurity concentration on the basis of an output of the detector, deposition of impurities on the optical element and deterioration of the optical characteristic of the optical element thereby can be prevented effectively.

Growing community of inventors

Utsunomiya, Japan

Masayuki Tanabe