Argus Chemical Corporation

Adeka Argus Chemical Co., Ltd.

Asahi Denka Kogyo Kabushiki Kaisha

Masayuki Takahashi

Motonobu Minagawa

Yutaka Nakahara

Tohru Haruna

Kazunori Nishikawa

Takashi Takeuchi

Toshinori Yukino

Kenji Tajima

Etsuo Tobita

A crystalline polymer composition comprising 100 parts by weight of a crystalline polymer and 0.005 to 5 parts by weight of a compound represented by formula (I):

Crystalline polymer composition

A polycarbonate resin composition improved in heat resistance by the addition of an organic cyclic phosphite represented by the general formula: ##STR1## wherein R.sub.1 represents an alkyl group having 1 to 9 carbon atoms; R.sub.2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and R.sub.3 represents an alkyl group having 1 to 30 carbon atoms.

Polycarbonate resin composition

Synthetic polymer compositions comprise 100 parts by weight of a synthetic polymer and 0.001 to 5 parts by weight of a benzotriazol compound, and thus possesses improved stability.

Stabilized synthetic polymer composition

A process for preparing diaryl pentaerythritol diphosphites by reaction of phosphorous trichloride, pentaerythritol and an alkyl phenol having the formula ##STR1## wherein: R.sub.1 is selected from the group consisting of tertiary alkyl having from about four to about eight carbon atoms and cyclohexyl; and

Process for preparing diaryl-pentaerythritol diphosphites

Alkylthiopropionyl hydrazino triazines are provided having the formula: ##STR1## wherein: R is alkyl having from one to about fifty carbon atoms;

Alkylthiopropionyl hydrazino triazines and synthetic resin compositions

This invention relates to a new class of phenolic compounds containing a phosphorus acid ester group which are stabilizers for synthetic resins and to synthetic resin stabilizer compositions comprising these phenolic compounds as well as to synthetic resins stabilized with such phenolic compounds and with stabilizer compositions comprising these phenolic compounds along with known polymer stabilizers.

Phenolic ester synthetic resin stabilizers

New polyhydric phenol coesters are disclosed of polyhydric phenols, having 2 to 3 phenolic hydroxyl groups and 1 to 3 benzenoid rings, with carbonic acid and an organophosphonic acid having linked to phosphorus as alkyl, aryl, aralkyl or alkaryl group optionally substituted with a phenolic hydroxyl group. The new coesters have molecular weights up to a maximum of about 10,000, preferably from 1000 to 9000, and are highly effective stabilizers for a variety of synthetic resins. Stabilizer compositions comprising a polyhydric phenol coester and a known polymer stabilizer, as well as synthetic resins stabilized with such stabilizer compositions, are also disclosed.

Organophosphonate coester stabilizers

New ortho-alkylhydroxybenzylpropanediol compounds of carboxylic acids, aldehydes, ketones, phosphites, phosphates, and phosphonates are disclosed. The propanediol compounds have in the molecule from one to four preferably from one to three ortho-alkylhydroxybenzylpropanediol units, each of which carries one to two ortho-alkylhydroxybenzyl groups, and are highly effective stabilizers for a variety of synthetic resins. Stabilizer compositions comprising a orthoalkylhydroxybenzylpropanediol compound and a known polymer stabilizer, as well as synthetic resins stabilized with such stabilizer compositions, are also disclosed.

Synthetic resins such as polyolefins, vinyl chloride polymers, ABS polymers, ethylene-vinyl acetate copolymers and polyesters are stabilized against deteriorating influences with new stabilizer compositions comprising certain hydroxyphenylalkylenephosphonic acid esters of polycarbocyclic polyhydroxy compounds having the general formula (1) ##STR1## (wherein, R.sub.1 denotes alkyl or cycloalkyl, R.sub.2 and R.sub.3 denote a hydrogen atom, alkyl or cycloalkyl. R.sub.4 denotes alkyl, cycloalkyl, arylalkyl, aryl, alkylaryl, alkylpolyoxyalkylene or a residue of polyhydricphenol. A is a residue of polynuclearpolyhydric phenol or hydrogenated derivative thereof of from 2 to 4 valent. n is 1 to 8. m is 1 to 5. L is 0, 1 or 2. X is a hydrogen atom or ##STR2##

Growing community of inventors

Tokorozawa, Japan

Masayuki Takahashi