Seiko Instruments Inc

The University of Tokyo

Masayuki Suda

Toshihiko Sakuhara

Manabu Oumi

Yoko Shinohara

Tatsuaki Ataka

Takeshi Uchiyama

Akito Ando

Masataka Shinogi

Fumiharu Iwasaki

Hiroshi Muramatsu

Kiyoshi Matsumoto

Isao Shimoyama

Hidetoshi Takahashi

Sachiko Tanabe

Kazuyoshi Furuta

Minh-Dung Nguyen

Ayako Nobe

Reiko Irie

Yoshiyuki Kaiho

Shuhei Yamamoto

Naoya Watanabe

Mitsuru Suginoya

Shigeru Senbonmatsu

Jun Shinohara

A tilt sensor includes: a pressure sensor disposed to be relatively movable with respect to a detection target object and configured to detect pressure of a fluid; and a tilt information detection unit configured to detect tilt information (for example, a tilt angle) of the detection target object according to an output of the pressure sensor and movement information of the pressure sensor.

Tilt sensor

A pressure change measuring apparatus and a pressure change measuring method are capable of detecting a change in pressure to be measured with respect to a time axis with high accuracy. The pressure change measuring apparatus includes a reference value setting unit that generates a reference value signal based on an output signal of a differential pressure measuring cantilever under a predetermined state and outputs the reference value signal. An arithmetic processing unit calculates the pressure change in the pressure to be measured based on the output signal, the reference value signal, a volume of a cavity, and a flowing quantity of a pressure transmission medium flowing into and out of the cavity for every unit of a predetermined time period.

Pressure change measurement device, altitude measurement device, and pressure change measurement method

An arithmetic processing unit included in a pressure change measuring apparatus includes a differential pressure calculation unit configured to obtain a pressure difference between an inner pressure of a cavity and a pressure to be measured based on an output signal of a differential pressure measuring cantilever. A pressure-to-be-measured calculating unit calculates the pressure to be measured based on a set inner pressure of the cavity and the differential pressure calculated by the differential pressure calculation unit. A flow rate calculating unit calculates a flowing quantity of a pressure transmission medium flowing into and out of the cavity for every unit of a predetermined time period based on the differential pressure calculated by the differential pressure calculation unit. An inner pressure updating unit calculates the inner pressure of the cavity after the predetermined time period based on the flowing quantity calculated by the flow rate calculating unit and a volume of the cavity, and updates, to the calculated inner pressure, a set value of the inner pressure of the cavity to be used by the pressure-to-be-measured calculating unit.

Pressure change measuring apparatus and pressure change measuring method

A pressure sensor which detects variation in pressures, the pressure sensor including a cantilever which is bent according to a pressure difference between the inside and the outside of a cavity in a sensor main body, and an intra-lever gap which is formed on a proximal end portion of the cantilever. The proximal end portion is partitioned into a first support portion and a second support portion by an intra-lever gap in a second direction orthogonal to a first direction in which the proximal end portion and a distal end portion are connected to each other in plan view. A doped layer which is provided on a portion of the first and second support portions forms a first displacement detection portion and a second displacement detection portion. Lengths of the first and second displacement detection portions are shorter than those of the first and second supports along the second direction.

Pressure sensor

A pressure sensor includes a sensor main body having a cavity, a cantilever having a lever main body and lever support-portion, which is bent according to a pressure difference between the cavity and sensor outside main body, and a displacement detection unit detects cantilever displacement based on resistance variation in resistance values of the main body-resistance portion formed in the lever main body and lever-resistance portion formed in the lever support-portion. A division groove is formed in the lever support; the division divides the lever-resistance portion into a first resistance portion electrically connected to a detection-electrode in series and second resistance portion closer to other adjacent lever support-portion than the first resistance portion. The first resistance portion of the lever support-portion electrically connected to the detection-electrode via a parallel path of a first path passing through the main body-resistance portion and second path passing through the second resistance portion.

Cantilever pressure sensor with division portions for dividing lever resistance and having piezoresistor element

A piezoelectric unitincludes a piezoelectric element that causes thickness shear vibration, a first electrode provided on one surface of the piezoelectric element, a second electrode and a third electrode which are provided on an opposite surface to the one surface which is provided with the first electrode of the piezoelectric element and are electrically insulated from each other, and a switching portion that is connected to the first electrode, the second electrode, and the third electrode, in which the switching portion can switch measurement modes between a mass/viscoelasticity measurement mode for measuring mass of a substance which is in contact with the piezoelectric element or viscoelasticity by vibrating the piezoelectric element, and an electrical characteristic measurement mode for measuring electrical characteristics between the second electrode and the third electrode.

Piezoelectric unit, piezoelectric device, piezoelectric determination apparatus, and state determination method

A QCM sensor for detecting a physical quantity of a sample includes a quartz crystal vibrator for measurement, a quartz crystal vibrator for reference, and a housing accommodating the quartz crystal vibrator for measurement and the quartz crystal vibrator for reference. The quartz crystal vibrator for measurement has a first electrode that is contacted by a measurement sample to be detected, and a first quartz substrate provided with a surface on which the first electrode is formed. The quartz crystal vibrator for reference has a second electrode that is contacted by a reference sample as a reference when detecting a physical quantity of the measurement sample, and a second quartz substrate provided with a surface on which the second electrode is formed. A confining portion connects to the housing to confine the reference sample in a state of contacting the second electrode.

QCM sensor

In an EL element including a light emitting layer sandwiched between upper and lower electrodes, of light emitted therefrom, light totally reflected at a light emitting layer interface is not taken out, so there is a problem in that light emission efficiency reduces. Therefore, a light scattering layer in which metal particles are dispersed is provided between an electrode and the light emitting layer. According to such a structure, the light from the light emitting layer can be scattered by the metal particles and taken out, thereby improving the light emission efficiency. When plasmon is excited in the metal particles, light confined in the light emitting layer or each layer adjacent thereto can be used, thereby improving light use efficiency.

Electroluminescence element having metal particles dispersed in light scattering layer

A structural body material layer is formed directly on a base substrate or via a sacrificing layer or a peeling layer, a groove is fabricated electrochemically along an outer configuration shape of a part constituting an object at the structural body material layer and thereafter, only the sacrificing layer or the base substrate is selectively removed or the part is mechanically separated from the peeling layer to thereby separate the part and the base substrate and provide the part constituting the object or fabricate a part having a movable portion by partially restricting a portion to be separated.

Part fabricating method

A part fabricating apparatus has a holder for holding an object to be machined immersed in an electrolytic solution. A machining electrode subjects a surface of the object to an electrochemical reaction to electrolytically machine the surface of the object. The machining electrode has a sharp-edged tip and is coated with an insulator except for the sharp-edged tip. A spacing changing unit detects and changes a spacing between the surface of the object and the machining electrode. A potential/current control unit controls a potential/current on the machining electrode. An electrolytic solution changing unit supplies a first electrolytic solution for subjecting the surface of the object to be machined to a removal process to fabricate a cast mold, supplies a second electrolytic solution for depositing a first metal on a surface of the cast mold to form a first metal layer, and supplies a third electrolytic solution for depositing a second metal inside the cast mold to form a part.

Part fabricating apparatus

A pump comprises a first substrate having a fluid inlet port for receiving a fluid, a fluid outlet port for discharging the fluid, a first pumping section for pumping the fluid from the fluid inlet port to the fluid outlet port, a first inlet valve section disposed between the fluid inlet port and the first pumping section, and a first outlet valve section disposed between the fluid outlet port and the first pumping section. A second substrate has a second pumping section, a second inlet valve section, and a second outlet valve section. An intermediate substrate is disposed between the first and second substrates to form a first fluid feeding path and a second fluid feeding path for feeding the fluid pumped by the first and second pumping sections. The first fluid feeding path extends from the first inlet valve section to the first outlet valve section through the first pumping section. The second fluid feeding path extends from the second inlet valve section to the second outlet valve section through the second pumping section. The intermediate substrate has a first connection port connecting the first and second inlet valve sections in fluid communication with the fluid inlet port and a second connection port connecting the first and second outlet valve sections in fluid communication with the fluid outlet port.

Pump and method of driving the same

A part fabricating method comprises the steps of machining an object to fabricate a part cast mold, depositing a first metal on a surface of the cast mold to form a first metal layer, and depositing a second metal different in kind from the first metal inside the cast mold to form a part. The first metal layer is then selectively removed to take out the part formed inside the cast mold.

Part fabricating method and part fabricating apparatus

An electrochemical machining method in which a work piece and a machining electrode are opposed to each other and dipped in an electrolyte solution, and a surface of the work piece is machined by causing an electrolytic reaction between the surface of the work piece and a tip of the machining electrode in a state where a separating distance between the surface of the work piece and the tip of the machining electrode is adjusted and a desired separating distance is maintained, wherein a zero contact reference position where the surface of the work piece and the tip of the machining electrode are brought into contact with each other and the separating distance between the work piece and the machining electrode is nullified is electrically detected, moving distances of the work piece and the machining electrode from the zero contact reference position are detected, a relative separating distance between the surface of the work piece and the tip of the machining electrode is calculated based on a result of the detection and the work piece is machined in a state where the desired separating distance is maintained.

Electrochemical machining method and electrochemical machining equipment

A method for performing fine working of a material by electrochemical reaction comprises a two-step scanning operation in which a surface topography of the material is obtained during a first scan which is used to control the position of a probe during a second scan in which an electrochemical reaction is performed. During the first scan, an electrochemical cell is constructed with a four-electrode system, including the probe, a material to be worked, a reference electrode and a counter electrode. The potential of each of the probe and the material to be worked is set so that no electrochemical reaction occurs during the first scan. Data representative of the surface topography is stored and used to control the position of the probe during the second scan in which an electrochemical cell is constructed with a three-electrode system, including the probe, the material, and the reference electrode. The potential of the material with respect to the probe is set such that the electrochemical reaction occurs during the second scan, and the probe is maintained at a distance determined based on the stored topographical data.

Method and apparatus for performing fine working

A method of forming a mask for photolithography comprises forming a transparent conductive film on a transparent substrate. The substrate and an electrode having a sharp front end are immersed in an electrolytic solution. The sharp front end of the electrode and the transparent film are then positioned close to each other while controlling a distance therebetween. The substrate and the electrode are then scanned relative to each other in two-dimensions while maintaining the distance between the sharp front end of the electrode and the transparent film constant. Thereafter, an electrochemical reaction is processed on the substrate while a voltage is applied between the transparent film and the electrode to form a mask pattern on the substrate. During repair of the mask thus formed, the substrate and the electrode are immersed in the electrolytic solution. The sharp front end of the electrode and a portion of the mask pattern to be repaired are positioned close to one another, and a distance between the sharp front end of the electrode and the mask pattern is controlled by detecting a tunnelling current flowing therebetween. Thereafter, a voltage is applied between the electrode and the mask pattern to either deposit a pattern material onto the portion of the mask pattern to be repaired or to dissolve a pattern material from the portion of the substrate pattern to be repaired.

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Chiba, Japan

Masayuki Suda