Showa Denko K.k.

Taiyo Holdings Co., Ltd.

Masayuki Kobayashi

Masao Arima

Nobuhito Ito

Takao Ichikawa

Atsuo Endo

Yumi Tsujimura

Atsushi Sakamoto

Syouji Nishiguchi

Kouji Ogawa

A copolymer of the present invention comprises a repeating unit derived from phenylphenyl (meth)acrylate; a repeating unit derived from a hydroxyphenyl group-containing unsaturated compound; and a repeating unit derived from an epoxy group-containing unsaturated compound. The copolymer of the present invention brings together excellent transparency and a high refractive index. A resin film formed from the copolymer of the present invention can be suitably utilized in the formation of a protective film or interlayer insulating film for an electronic part such as a liquid crystal display device, an integrated circuit device, or a solid-state imaging device, the formation of a microlens or a microlens array, the formation of an optical waveguide, or the like.

Copolymer, monomer composition, resin solution, and resin film

A carboxyl group-containing photosensitive resin is obtained by reacting an &#x3b1;,&#x3b2;-ethylenically unsaturated group-containing monocarboxylic acid (c) with a phenolic compound (a) containing the structure represented by the following general formula (I) and having at least two phenolic hydroxyl groups in its molecule, wherein part or the whole of the phenolic hydroxyl groups being modified into an oxyalkyl group, and further reacting a polybasic acid anhydride (d) with the resultant reaction product; wherein Rrepresents either one of a hydrocarbon radical of 1 to 11 carbon atoms, a SOgroup, an oxygen atom and sulfur atom, Rrepresents a hydrocarbon radical of 1 to 11 carbon atoms, 'a' represents an integer of 0 to 3, 'n' represents an integer of 1 to 2, and &#x201c;m&#x201d; represents an integer of 1 to 10.

Photosensitive resin, curable resin composition containing the same, dry film thereof, and printed circuit board using them

Growing community of inventors

Isesaki, Japan

Masayuki Kobayashi