Nissan Chemical Industries Limited

Masayoshi Suzuki

Taku Kato

Junpei Kobayashi

Keisuke Shuto

Kazuyoshi Hosaka

Mariko Shudo

Yoshinari Koyama

Natsumi Murakami

Tomoki Furukawa

Daiki Iijima

A coating film-forming composition includes a hydrolysis-condensation product of a hydrolyzable silane and fine inorganic particles subjected to a special dispersion treatment, that can be formed into a highly heat-resistant, highly transparent coating film capable of exhibiting a high refractive index and having a large thickness and excellent storage stability as a coating composition; and a process for producing the coating film-forming composition.

Coating film-forming composition and process for producing the same

A imprint material is provided, and a film that is prepared from the material and to which the pattern is transferred. An imprint material including: (A), (B), (C) and (D) components; a ratio of the amount of the (B) component to a total amount of the (A) component and the (B) component of 100% by mass is 5% by mass or more and 25% by mass or less: (A) a silsesquioxane compound having a repeating unit of Formula (1) and having two or more polymerizable groups of Xin Formula (1); (B) a silicone compound having a repeating unit of Formula (2) and having two polymerizable groups at ends thereof; (C) a photopolymerization initiator; and (D) a solvent wherein the formulae, Rand Rare each independently a Calkyl group; Ris a Calkylene group; and k is an integer of 0 to 3.

Imprint material containing silsesquioxane compound and modified silicone compound

A novel imprint material and film produced from the material, on which a pattern is transferred. An imprint material having: a component (A); a component (B); a component (C); and a component (D), wherein, (A): a compound of Formula (1), Formula (2), or Formula (3): wherein, X is Clinear alkylene, Ris H or CH; each of R, R, and Ris independently H, CH, or CH; and the sum of the number of carbon atoms on R, R, and Ris 0 to 2; (B): a silsesquioxane compound having a repeating unit of Formula (4), and having two or more polymerizable groups of Y; (C): a silicone compound having a repeating unit of Formula (5), and having two polymerizable groups on its ends: wherein, each of Rand Ris independently Calkyl; Ris Calkylene; and k is 0 to 3; and (D): photopolymerization initiator.

Imprint material

A sealing material composition for LED has excellent heat-resistant transparency, adhesion, and crack resistance, and low sulfur gas permeability. A sealing material composition for LED has the following (A), (B), (C), and (D): (A): polysiloxane containing units (1-1), (1-2), and (1-3): wherein Ris Calkyl or Caryl, Ris hydrogen, Calkyl, or Si constituting main chain of polysiloxane as (A); (B): polysiloxane containing units (2-1), (2-2), and (2-3): wherein Rand Rare each hydrogen, Calkyl, or Si constituting main chain of polysiloxane as (B); (C): adhesive; and (D): condensation catalyst for silanol group.

Sealing material composition for LED

There is provided an imprint material that has sufficient adhesion to film substrates and excellent scratch resistance, and can be readily released from a mold at the time of mold release. An imprint material including: (A) a specific acrylamide such as N,N'-dimethylacrylamide; (B) a compound having alkylene oxide units and having 2 to 6 polymerizable groups at the ends of the compound, in which the alkylene oxide units are ethylene oxide units, propylene oxide units, or a combination thereof; and (C) a photopolymerization initiator.

An imprint material which is in a transparent and homogeneous varnish form, is not peeled off in cross-cut tests, in which the adhesion of coating films is evaluated, and forms films that can have a mold release force of 0.5 g/cm or less. An imprint material including: a component (A): a compound containing at least one alkylene oxide unit having carbon atom number of 2, 3 or 4 and at least two polymerizable groups; a component (B): a photopolymerization initiator; a component (C): a solvent that swells or dissolves a surface portion of a film base material to which the imprint material is applied; and a component (D): a silicone compound.

There is provided an imprint material that allows a resin film to be readily released from a mold at the time of mold release after curing, that is, an imprint material that forms a film having a low mold release property as well as high transparency, high scratch resistance, and a high fingerprint wiping-off property; and a film which is formed from the material and to which a pattern is transferred. An imprint material including: a (A) component: a compound having a propylene oxide unit and two polymerizable groups or a compound having a propylene oxide unit, an ethylene oxide unit, and two polymerizable groups; a (B) component: a silicone compound; and a (C) component: a photopolymerization initiator.

Imprint material having low mold release property

There is provided a planarizing film-forming composition for a hard disk. A planarizing film-forming composition for a hard disk comprising a hydrophobic coating material having a photopolymerizable group and an aromatic group, containing a polymer or a combination of a polymer and a compound selected from the group consisting of a polymer (A1) including an aromatic group, having a molecular weight of 300 to 5000, and being a liquid at normal temperature under atmospheric pressure, a polymer (A2) including at least two photopolymerizable groups, having a molecular weight of 300 to 5000, and being a liquid at normal temperature under atmospheric pressure, a polymer (A3) including an aromatic group and at least two photopolymerizable groups, having a molecular weight of 300 to 5000, and being a liquid at normal temperature under atmospheric pressure, a compound (a1) including an aromatic group, having a molecular weight of 100 to 1000, and being a liquid at normal temperature under atmospheric pressure, a compound (a2) including at least two photopolymerizable groups, having a molecular weight of 100 to 1000, and being a liquid at normal temperature under atmospheric pressure, and a compound (a3) including an aromatic group and at least two photopolymerizable groups, having a molecular weight of 100 to 1000, and being a liquid at normal temperature under atmospheric pressure.

Film forming composition for hard disk

There is provided an imprint material forming a film having high abrasion resistance even after a pattern has been transferred thereto, specifically an imprint material forming a film having a small number of pieces of scratch when the film after a pattern has been transferred thereto is subjected to a steel wool abrasion test. An imprint material comprising: a component (A): a compound having at least one ethylene oxide unit and having at least one polymerizable group; a component (B): a polycaprolactone-modified urethane compound having a Clong chain alkyl group and at least one polymerizable group; and a component (C): a photopolymerization initiator.

Highly abrasion-resistant imprint material containing urethane compound

There is provided an imprint material from which a film having a high hardness can be formed. An imprint material comprising a component (A), a component (B) and a component (C), the component (A) being a compound having, in the molecule thereof, five or more polymerizable groups, the component (B) being a compound having, in the molecule thereof, two polymerizable groups, and the component (C) being a photo-radical generator.

High hardness imprint material

There is provided a color resist composition comprising a resin (A), a photoacid generator or a photobase generator (B), a crosslinking compound (C) and a dye mixture (D) containing a dye having a structure of amino sulfonate ester or ammonium sulfonate salt in a proportion of 40 to 95% by weight on total dye content. Preferably, resin (A) is polyvinyl phenol or a copolymer thereof, and the color resist composition has an optical quality having at least a region with a transmittance of 70% or more and a region with a transmittance of 10% or less in wavelength range between 400 nm and 700 nm, and in which a variation in transmittance is 5% or less even when the composition is subjected to a temperature of 200&#xb0; C. or more. The color resist composition is applicable for color filters which exhibits a high spectrum reproducibility, a high light-resistance and a heat-resistance, and has a high resolution of 5 &#x3bc;m or less and no post development residue.

Dye-containing resist composition and color filter using same

There is provided a dye-containing resist composition comprising a ketol solvent; a negative type resist composition comprising a resin, a photoacid generator or a photobase generator, a crosslinking compound, a dye and a ketol solvent; a negative type resist composition comprising a resin, a photoradical generator, a crosslinking compound, a dye and a ketol solvent; a positive type resist composition comprising a resin, a photoacid generator, a crosslinking compound, a dye and a ketol solvent. The ketol is preferably &#x3b2;-hydroxyketone, more preferably 4-hydroxy-4-methyl-2-pentanone. The resist composition does not occur problems such as occurrence of foreign matters (particles) even when the concentration of dye is increased, and enables the production of color filters in a shape of thinner film.

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Funabashi, Japan

Masayoshi Suzuki